High throughput X-ray diffractometer for combinatorial epitaxial thin films

M. Ohtani, T. Fukumura, A. Ohtomo, T. Kikuchi, K. Omote, H. Koinuma, M. Kawasaki

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

We report on the development of a high throughput x-ray diffractometer that concurrently measures spatially resolved x-ray diffraction (XRD) spectra of epitaxial thin films integrated on a substrate. A convergent x-ray is focused into a stripe on a substrate and the diffracted beam is detected with a two-dimensional x-ray detector, so that the snapshot image represents a mapping of XRD intensity with the axes of the diffraction angle and the position in the sample. High throughput characterization of crystalline structure is carried out for a BaxSr1-xTiO3 composition-spread film on a SrTiO3 substrate. Not only the continuous spread of the composition (x), but also the continuous spread of the growth temperature (T) are given to the film by employing a special heating method. The boundary between the strained lattice and relaxed lattice is visualized by the concurrent XRD as functions of x and T in a high throughput fashion.

Original languageEnglish
Pages (from-to)125-130
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume700
Publication statusPublished - 2002 Jan 1
Externally publishedYes
EventCombinatorial and Artificial Intelligence Methods in Materials Science - Boston, MA, United States
Duration: 2001 Nov 262001 Nov 29

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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  • Cite this

    Ohtani, M., Fukumura, T., Ohtomo, A., Kikuchi, T., Omote, K., Koinuma, H., & Kawasaki, M. (2002). High throughput X-ray diffractometer for combinatorial epitaxial thin films. Materials Research Society Symposium - Proceedings, 700, 125-130.