High-throughput screening of flux materials for single crystal growth by combinatorial pulsed laser deposition

R. Takahashi, T. Tanigawa, Y. Yamamoto, Y. Yonezawa, Y. Matsumoto, H. Koinuma

Research output: Contribution to journalConference articlepeer-review

Abstract

We propose a new concept and method for high throughput screening of flux materials used in the bulk single crystal growth. The concept of our tri-phase epitaxy has been generalized as the flux-mediated epitaxy with the aid of quick optimization of flux materials in the combinatorial thin-film technology. Here, we report on the successful discovery of a new flux composition of Bi-Ti-Cu-O for the growth of high-quality Bi4Ti3O12 bulk crystal and thin film.

Original languageEnglish
Pages (from-to)69-74
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume804
DOIs
Publication statusPublished - 2003
Externally publishedYes
EventCombinatorial and Artificial Intelligence Methods in Materials Science II - Boston, MA., United States
Duration: 2003 Dec 12003 Dec 4

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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