High Temperature Stability of Anatase Films Prepared by MOCVD

Rong Tu, Takashi Goto

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

Highly thermally stable anatase films were prepared by metal-organic chemical vapor deposition (MOCVD) using Ti(O-i-Pr)2(dpm)2 as precursor. The effect of heat treatment on the microstructure, transmittance, optical band gap and refractive index of anatase films was investigated. Anatase films in a single phase were obtained at Tsub (substrate temperature) < 723 K. By heat-treating the anatase film at 1273 K. no phase transformation was observed without changing the transmittance and optical band gap, whereas the refractive index increased. A small amount of rutile phase was identified in the anatase film by heat-treating at 1323 K. The anatase films transformed into rutile in a single phase by heat-treating at 1373K, resulting in a decrease in transmittance and optical bandgap and an increase in refractive index.

Original languageEnglish
Pages (from-to)2040-2046
Number of pages7
JournalMaterials Transactions
Volume49
Issue number9
DOIs
Publication statusPublished - 2008 Sep

Keywords

  • Anatase
  • Metal-organic chemical vapor deposition (CVD)
  • Phase transition
  • Rutile

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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