High temperature oxidation of hot-pressed aluminium nitride by water vapour

Tsugio Sato, Kiyotaka Haryu, Tadashi Endo, Masahiko Shimada

Research output: Contribution to journalArticle

55 Citations (Scopus)

Abstract

Hot pressed AIN without additives was oxidized et 1100 to 1400°C in dry air, wet air and wet nitrogen gas atmospheres with 1.5 to 20 kPa of water vapour pressure. AIN was oxidized by both air and water vapour, and formed α-Al2O3 film on the surface above 1150°C. The oxidation kinetics in air were parabolic end were promoted by water vapour. On the other hand, the oxidation kinetics in wet nitrogen were linear below 1250°C and parabolic above 1350°C. The oxidation rate in wet nitrogen was much greater than that in wet air. The rate of oxidation increased with increasing temperature until 1350°C, and then decreased. The parabolic rate constant decreased with increasing temperature and increased linearly with increasing water vapour pressure. The linear rate constant at 1150 to 1250° C increased with increasing the temperature with the apparent activation energy of 250 kJ mol-1. The relation between the linear rate constant and water vapour pressure was of the Langmuir type.

Original languageEnglish
Pages (from-to)2277-2280
Number of pages4
JournalJournal of Materials Science
Volume22
Issue number6
DOIs
Publication statusPublished - 1987 Jun 1

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'High temperature oxidation of hot-pressed aluminium nitride by water vapour'. Together they form a unique fingerprint.

  • Cite this