Epitaxial (110) SrTiO3 films were prepared on (110) MgAl2O4 substrates using laser chemical vapour deposition (LCVD). The effect of the deposition temperature on the orientation and microstructures was investigated. The (111)/(110) co-oriented SrTiO3 films were prepared in the temperature range 980-1030 K, while epitaxial (110) SrTiO3 films were obtained in the range 1063-1073 K. The films showed columnar cross-sections with truncated prismatic surface grains. The deposition rate of the epitaxial films ranged from 20 to 25 μm h-1, which was 35-250 times higher than the rates reported for conventional CVD.
- Epitaxial growth
- High-speed deposition
- Laser chemical vapour deposition
ASJC Scopus subject areas
- Materials Science(all)