High-speed Epitaxial Growth of (110) SrTiO3 Films on (110) MgAl2O4 Substrates using Laser Chemical Vapour Deposition

Jianchao Chen, Akihiko Ito, Takashi Goto

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


Epitaxial (110) SrTiO3 films were prepared on (110) MgAl2O4 substrates using laser chemical vapour deposition (LCVD). The effect of the deposition temperature on the orientation and microstructures was investigated. The (111)/(110) co-oriented SrTiO3 films were prepared in the temperature range 980-1030 K, while epitaxial (110) SrTiO3 films were obtained in the range 1063-1073 K. The films showed columnar cross-sections with truncated prismatic surface grains. The deposition rate of the epitaxial films ranged from 20 to 25 μm h-1, which was 35-250 times higher than the rates reported for conventional CVD.

Original languageEnglish
Pages (from-to)11461-11464
Number of pages4
JournalMaterials Today: Proceedings
Issue number11
Publication statusPublished - 2017


  • Epitaxial growth
  • High-speed deposition
  • Laser chemical vapour deposition
  • SrTiO

ASJC Scopus subject areas

  • Materials Science(all)

Fingerprint Dive into the research topics of 'High-speed Epitaxial Growth of (110) SrTiO<sub>3</sub> Films on (110) MgAl<sub>2</sub>O<sub>4</sub> Substrates using Laser Chemical Vapour Deposition'. Together they form a unique fingerprint.

Cite this