High-speed Epitaxial Growth of (110) SrTiO3 Films on (110) MgAl2O4 Substrates using Laser Chemical Vapour Deposition

Jianchao Chen, Akihiko Ito, Takashi Goto

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Epitaxial (110) SrTiO3 films were prepared on (110) MgAl2O4 substrates using laser chemical vapour deposition (LCVD). The effect of the deposition temperature on the orientation and microstructures was investigated. The (111)/(110) co-oriented SrTiO3 films were prepared in the temperature range 980-1030 K, while epitaxial (110) SrTiO3 films were obtained in the range 1063-1073 K. The films showed columnar cross-sections with truncated prismatic surface grains. The deposition rate of the epitaxial films ranged from 20 to 25 μm h-1, which was 35-250 times higher than the rates reported for conventional CVD.

Original languageEnglish
Pages (from-to)11461-11464
Number of pages4
JournalMaterials Today: Proceedings
Volume4
Issue number11
DOIs
Publication statusPublished - 2017

Keywords

  • Epitaxial growth
  • High-speed deposition
  • Laser chemical vapour deposition
  • SrTiO

ASJC Scopus subject areas

  • Materials Science(all)

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