High-speed deposition of zirconia films by laser-induced plasma CVD

Takashi Goto

Research output: Contribution to journalArticlepeer-review

37 Citations (Scopus)

Abstract

Chemical vapor deposition (CVD) has been commonly applied to prepare thin films. However, the application of CVD can be expanded to thick coatings such as thermal barrier coatings (TBCs) by accelerating deposition rates. In this paper, the recent development of high-speed deposition for yttria-stabilized zirconia (YSZ) films by conventional thermal CVD and plasma-enhanced CVD (PE-CVD) has been briefly reviewed. A laser CVD (LCVD) process has been recently developed attaining an extremely high deposition rate of 660 μm/h. Plasma emerged during the laser CVD, and the relating plasma diagnosis is described.

Original languageEnglish
Pages (from-to)225-229
Number of pages5
JournalSolid State Ionics
Volume172
Issue number1-4 SPEC. ISS.
DOIs
Publication statusPublished - 2004 Aug 31

Keywords

  • CVD
  • Columnar structure
  • Deposition rate
  • Laser CVD
  • Plasma CVD
  • Yttria-stabilized zirconia

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

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