High-speed deposition of zirconia films by laser-induced plasma CVD

Takashi Goto

doi:10.1016/j.ssi.2004.02.034

High-speed deposition of zirconia films by laser-induced plasma CVD

Takashi Goto

Materials Processing and Characterization Division

Research output: Contribution to journal › Article › peer-review

34 Citations (Scopus)

Abstract

Chemical vapor deposition (CVD) has been commonly applied to prepare thin films. However, the application of CVD can be expanded to thick coatings such as thermal barrier coatings (TBCs) by accelerating deposition rates. In this paper, the recent development of high-speed deposition for yttria-stabilized zirconia (YSZ) films by conventional thermal CVD and plasma-enhanced CVD (PE-CVD) has been briefly reviewed. A laser CVD (LCVD) process has been recently developed attaining an extremely high deposition rate of 660 μm/h. Plasma emerged during the laser CVD, and the relating plasma diagnosis is described.

Original language	English
Pages (from-to)	225-229
Number of pages	5
Journal	Solid State Ionics
Volume	172
Issue number	1-4 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.ssi.2004.02.034
Publication status	Published - 2004 Aug 31

Keywords

CVD
Columnar structure
Deposition rate
Laser CVD
Plasma CVD
Yttria-stabilized zirconia

ASJC Scopus subject areas

Chemistry(all)
Materials Science(all)
Condensed Matter Physics

Access to Document

10.1016/j.ssi.2004.02.034

Fingerprint Dive into the research topics of 'High-speed deposition of zirconia films by laser-induced plasma CVD'. Together they form a unique fingerprint.

Cite this

@article{060526bde07c403bb9edb14acd3f5a21,

title = "High-speed deposition of zirconia films by laser-induced plasma CVD",

abstract = "Chemical vapor deposition (CVD) has been commonly applied to prepare thin films. However, the application of CVD can be expanded to thick coatings such as thermal barrier coatings (TBCs) by accelerating deposition rates. In this paper, the recent development of high-speed deposition for yttria-stabilized zirconia (YSZ) films by conventional thermal CVD and plasma-enhanced CVD (PE-CVD) has been briefly reviewed. A laser CVD (LCVD) process has been recently developed attaining an extremely high deposition rate of 660 μm/h. Plasma emerged during the laser CVD, and the relating plasma diagnosis is described.",

keywords = "CVD, Columnar structure, Deposition rate, Laser CVD, Plasma CVD, Yttria-stabilized zirconia",

author = "Takashi Goto",

year = "2004",

month = aug,

day = "31",

doi = "10.1016/j.ssi.2004.02.034",

language = "English",

volume = "172",

pages = "225--229",

journal = "Solid State Ionics",

issn = "0167-2738",

publisher = "Elsevier",

number = "1-4 SPEC. ISS.",

}

TY - JOUR

T1 - High-speed deposition of zirconia films by laser-induced plasma CVD

AU - Goto, Takashi

PY - 2004/8/31

Y1 - 2004/8/31

N2 - Chemical vapor deposition (CVD) has been commonly applied to prepare thin films. However, the application of CVD can be expanded to thick coatings such as thermal barrier coatings (TBCs) by accelerating deposition rates. In this paper, the recent development of high-speed deposition for yttria-stabilized zirconia (YSZ) films by conventional thermal CVD and plasma-enhanced CVD (PE-CVD) has been briefly reviewed. A laser CVD (LCVD) process has been recently developed attaining an extremely high deposition rate of 660 μm/h. Plasma emerged during the laser CVD, and the relating plasma diagnosis is described.

AB - Chemical vapor deposition (CVD) has been commonly applied to prepare thin films. However, the application of CVD can be expanded to thick coatings such as thermal barrier coatings (TBCs) by accelerating deposition rates. In this paper, the recent development of high-speed deposition for yttria-stabilized zirconia (YSZ) films by conventional thermal CVD and plasma-enhanced CVD (PE-CVD) has been briefly reviewed. A laser CVD (LCVD) process has been recently developed attaining an extremely high deposition rate of 660 μm/h. Plasma emerged during the laser CVD, and the relating plasma diagnosis is described.

KW - CVD

KW - Columnar structure

KW - Deposition rate

KW - Laser CVD

KW - Plasma CVD

KW - Yttria-stabilized zirconia

UR - http://www.scopus.com/inward/record.url?scp=7544234107&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=7544234107&partnerID=8YFLogxK

U2 - 10.1016/j.ssi.2004.02.034

DO - 10.1016/j.ssi.2004.02.034

M3 - Article

AN - SCOPUS:7544234107

VL - 172

SP - 225

EP - 229

JO - Solid State Ionics

JF - Solid State Ionics

SN - 0167-2738

IS - 1-4 SPEC. ISS.

ER -