Abstract
Chemical vapor deposition (CVD) has been commonly applied to prepare thin films. However, the application of CVD can be expanded to thick coatings such as thermal barrier coatings (TBCs) by accelerating deposition rates. In this paper, the recent development of high-speed deposition for yttria-stabilized zirconia (YSZ) films by conventional thermal CVD and plasma-enhanced CVD (PE-CVD) has been briefly reviewed. A laser CVD (LCVD) process has been recently developed attaining an extremely high deposition rate of 660 μm/h. Plasma emerged during the laser CVD, and the relating plasma diagnosis is described.
Original language | English |
---|---|
Pages (from-to) | 225-229 |
Number of pages | 5 |
Journal | Solid State Ionics |
Volume | 172 |
Issue number | 1-4 SPEC. ISS. |
DOIs | |
Publication status | Published - 2004 Aug 31 |
Keywords
- CVD
- Columnar structure
- Deposition rate
- Laser CVD
- Plasma CVD
- Yttria-stabilized zirconia
ASJC Scopus subject areas
- Chemistry(all)
- Materials Science(all)
- Condensed Matter Physics