High speed deposition of y 2O 3 films by laser-assisted chemical vapor deposition

Ryan Banal, Teiichi Kimura, Takashi Goto

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

Thick yttria (Y 2O 3) films were synthesized at high speeds by laser-assisted chemical vapor deposition (LCVD) using an Y(dpm) 3 (dpm = dipivaloylmethanate) precursor. The effects of deposition conditions on the deposition rate and their microstructure were investigated. While the deposition rate was less than a few microns per hour at low laser powers (P L) less than 100 W, significantly high deposition rates of more than 200 μm/h (56 nm/s) were obtained at P L more than 160 W. The highest deposition rate in this study was 300 μm/h (83 nm/s) being 100 to 1000 times greater than those of conventional CVD processes. Deposited films were dense and isotropic with no preferred orientation showing cauliflower-like microstructure.

Original languageEnglish
Pages (from-to)2114-2116
Number of pages3
JournalMaterials Transactions
Volume46
Issue number9
DOIs
Publication statusPublished - 2005 Sep

Keywords

  • Cauliflower-like microstructure
  • Deposition rate
  • Laser chemical vapor deposition
  • Y O film
  • Y(dpm)

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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