TY - JOUR
T1 - High-speed deposition of titanium carbide coatings by laser-assisted metal-organic CVD
AU - Gong, Yansheng
AU - Tu, Rong
AU - Goto, Takashi
N1 - Funding Information:
This work was financially supported by Global COE Program “Materials Integration (International Center of Education and Research), Tohoku University”, and was also supported by the 111 Project (B13035), State Key Laboratory of Advanced Technology for Materials Synthesis and Processing (Wuhan University of Technology) and Fundamental Research Founds for National University China University of Geosciences (Wuhan) CUG120118.
PY - 2013/8
Y1 - 2013/8
N2 - A semiconductor laser-assisted chemical vapor deposition (LCVD) of titanium carbide (TiCx) coatings on Al2O3 substrate using tetrakis (diethylamido) titanium (TDEAT) and C2H2 as source materials were investigated. The influences of laser power (P L) and pre-heating temperature (Tpre) on the microstructure and deposition rate of TiCx coatings were examined. Single phase of TiCx coatings were obtained at PL = 100-200 W. TiCx coatings had a cauliflower-like surface and columnar cross section. TiCx coatings in the present study had the highest Rdep (54 μm/h) at a relative low Tdep than those of conventional CVD-TiCx coatings. The highest volume deposition rate (Vdep) of TiCx coatings was about 4.7 × 10 -12 m3 s-1, which had 3-105 times larger deposition area and 1-4 order lower laser density than those of previous LCVD using CO2, Nd:YAG and argon ion laser.
AB - A semiconductor laser-assisted chemical vapor deposition (LCVD) of titanium carbide (TiCx) coatings on Al2O3 substrate using tetrakis (diethylamido) titanium (TDEAT) and C2H2 as source materials were investigated. The influences of laser power (P L) and pre-heating temperature (Tpre) on the microstructure and deposition rate of TiCx coatings were examined. Single phase of TiCx coatings were obtained at PL = 100-200 W. TiCx coatings had a cauliflower-like surface and columnar cross section. TiCx coatings in the present study had the highest Rdep (54 μm/h) at a relative low Tdep than those of conventional CVD-TiCx coatings. The highest volume deposition rate (Vdep) of TiCx coatings was about 4.7 × 10 -12 m3 s-1, which had 3-105 times larger deposition area and 1-4 order lower laser density than those of previous LCVD using CO2, Nd:YAG and argon ion laser.
KW - A. Carbides
KW - B. Laser deposition
KW - C. High speed deposition
KW - D. Electron microscopy
KW - E. Surface properties
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U2 - 10.1016/j.materresbull.2013.03.039
DO - 10.1016/j.materresbull.2013.03.039
M3 - Article
AN - SCOPUS:84878275131
VL - 48
SP - 2766
EP - 2770
JO - Materials Research Bulletin
JF - Materials Research Bulletin
SN - 0025-5408
IS - 8
ER -