High-speed deposition of tetragonal-ZrO2-dispersed SiO2 nanocomposite films by laser chemical vapor deposition

Ling Fang Xu, Akihiko Ito, Takashi Goto

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


Tetragonal-ZrO2 (t-ZrO2)-dispersed amorphous SiO2 composite films were prepared by laser chemical vapor deposition at high deposition rates of 40-300 μm h-1. Without SiO2 the films prepared at deposition temperatures of 869-1246 K contained monoclinic ZrO2. ZrO2 was stabilized in its tetragonal phase in an amorphous SiO2 matrix at deposition temperatures of 867-1170 K. The t-ZrO2 particle size decreased from 21 to 11 nm with increasing deposition temperature. In the amorphous SiO2 matrix, t-ZrO2 nanoparticles formed a network structure at lower deposition temperatures, whereas the t-ZrO2 nanoparticles were homogeneously dispersed at higher deposition temperatures.

Original languageEnglish
Pages (from-to)85-89
Number of pages5
JournalMaterials Letters
Publication statusPublished - 2015 Sep 1


  • Film
  • Laser CVD
  • Nanocomposite
  • Silica
  • Zirconia

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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