High-speed deposition of tetragonal-ZrO2-dispersed SiO2 nanocomposite films by laser chemical vapor deposition

Ling Fang Xu; Akihiko Ito; Takashi Goto

doi:10.1016/j.matlet.2015.04.065

High-speed deposition of tetragonal-ZrO₂-dispersed SiO₂ nanocomposite films by laser chemical vapor deposition

Ling Fang Xu, Akihiko Ito, Takashi Goto

Materials Processing and Characterization Division

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Tetragonal-ZrO₂ (t-ZrO₂)-dispersed amorphous SiO₂ composite films were prepared by laser chemical vapor deposition at high deposition rates of 40-300 μm h^-1. Without SiO₂ the films prepared at deposition temperatures of 869-1246 K contained monoclinic ZrO₂. ZrO₂ was stabilized in its tetragonal phase in an amorphous SiO₂ matrix at deposition temperatures of 867-1170 K. The t-ZrO₂ particle size decreased from 21 to 11 nm with increasing deposition temperature. In the amorphous SiO₂ matrix, t-ZrO₂ nanoparticles formed a network structure at lower deposition temperatures, whereas the t-ZrO₂ nanoparticles were homogeneously dispersed at higher deposition temperatures.

Original language	English
Pages (from-to)	85-89
Number of pages	5
Journal	Materials Letters
Volume	154
DOIs	https://doi.org/10.1016/j.matlet.2015.04.065
Publication status	Published - 2015 Sep 1

Keywords

Film
Laser CVD
Nanocomposite
Silica
Zirconia

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Access to Document

10.1016/j.matlet.2015.04.065

Cite this

@article{41a9325a14654e26bd995aa234fd0d65,

title = "High-speed deposition of tetragonal-ZrO2-dispersed SiO2 nanocomposite films by laser chemical vapor deposition",

abstract = "Tetragonal-ZrO2 (t-ZrO2)-dispersed amorphous SiO2 composite films were prepared by laser chemical vapor deposition at high deposition rates of 40-300 μm h-1. Without SiO2 the films prepared at deposition temperatures of 869-1246 K contained monoclinic ZrO2. ZrO2 was stabilized in its tetragonal phase in an amorphous SiO2 matrix at deposition temperatures of 867-1170 K. The t-ZrO2 particle size decreased from 21 to 11 nm with increasing deposition temperature. In the amorphous SiO2 matrix, t-ZrO2 nanoparticles formed a network structure at lower deposition temperatures, whereas the t-ZrO2 nanoparticles were homogeneously dispersed at higher deposition temperatures.",

keywords = "Film, Laser CVD, Nanocomposite, Silica, Zirconia",

author = "Xu, {Ling Fang} and Akihiko Ito and Takashi Goto",

note = "Funding Information: This research was supported in part by a Grant-in-Aid for Young Scientists (A) (no. 25709069 ) from the Japan Society for the Promotion of Science (JSPS) . This work was also supported by the Council for Science, Technology and Innovation (CSTI) , Cross-ministerial Strategic Innovation Promotion Program (SIP) “Structural Materials for Innovation” (Funding agency: JST ). Publisher Copyright: {\textcopyright} 2015 Elsevier B.V. All rights reserved.",

year = "2015",

month = sep,

day = "1",

doi = "10.1016/j.matlet.2015.04.065",

language = "English",

volume = "154",

pages = "85--89",

journal = "Materials Letters",

issn = "0167-577X",

publisher = "Elsevier",

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T1 - High-speed deposition of tetragonal-ZrO2-dispersed SiO2 nanocomposite films by laser chemical vapor deposition

AU - Xu, Ling Fang

AU - Ito, Akihiko

AU - Goto, Takashi

N1 - Funding Information: This research was supported in part by a Grant-in-Aid for Young Scientists (A) (no. 25709069 ) from the Japan Society for the Promotion of Science (JSPS) . This work was also supported by the Council for Science, Technology and Innovation (CSTI) , Cross-ministerial Strategic Innovation Promotion Program (SIP) “Structural Materials for Innovation” (Funding agency: JST ). Publisher Copyright: © 2015 Elsevier B.V. All rights reserved.

PY - 2015/9/1

Y1 - 2015/9/1

N2 - Tetragonal-ZrO2 (t-ZrO2)-dispersed amorphous SiO2 composite films were prepared by laser chemical vapor deposition at high deposition rates of 40-300 μm h-1. Without SiO2 the films prepared at deposition temperatures of 869-1246 K contained monoclinic ZrO2. ZrO2 was stabilized in its tetragonal phase in an amorphous SiO2 matrix at deposition temperatures of 867-1170 K. The t-ZrO2 particle size decreased from 21 to 11 nm with increasing deposition temperature. In the amorphous SiO2 matrix, t-ZrO2 nanoparticles formed a network structure at lower deposition temperatures, whereas the t-ZrO2 nanoparticles were homogeneously dispersed at higher deposition temperatures.

AB - Tetragonal-ZrO2 (t-ZrO2)-dispersed amorphous SiO2 composite films were prepared by laser chemical vapor deposition at high deposition rates of 40-300 μm h-1. Without SiO2 the films prepared at deposition temperatures of 869-1246 K contained monoclinic ZrO2. ZrO2 was stabilized in its tetragonal phase in an amorphous SiO2 matrix at deposition temperatures of 867-1170 K. The t-ZrO2 particle size decreased from 21 to 11 nm with increasing deposition temperature. In the amorphous SiO2 matrix, t-ZrO2 nanoparticles formed a network structure at lower deposition temperatures, whereas the t-ZrO2 nanoparticles were homogeneously dispersed at higher deposition temperatures.

KW - Film

KW - Laser CVD

KW - Nanocomposite

KW - Silica

KW - Zirconia

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JO - Materials Letters

JF - Materials Letters

SN - 0167-577X

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