Abstract
Tetragonal-ZrO2 (t-ZrO2)-dispersed amorphous SiO2 composite films were prepared by laser chemical vapor deposition at high deposition rates of 40-300 μm h-1. Without SiO2 the films prepared at deposition temperatures of 869-1246 K contained monoclinic ZrO2. ZrO2 was stabilized in its tetragonal phase in an amorphous SiO2 matrix at deposition temperatures of 867-1170 K. The t-ZrO2 particle size decreased from 21 to 11 nm with increasing deposition temperature. In the amorphous SiO2 matrix, t-ZrO2 nanoparticles formed a network structure at lower deposition temperatures, whereas the t-ZrO2 nanoparticles were homogeneously dispersed at higher deposition temperatures.
Original language | English |
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Pages (from-to) | 85-89 |
Number of pages | 5 |
Journal | Materials Letters |
Volume | 154 |
DOIs | |
Publication status | Published - 2015 Sep 1 |
Keywords
- Film
- Laser CVD
- Nanocomposite
- Silica
- Zirconia
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering