High-speed deposition of dense, dendritic and porous SiO2 films by Nd: YAG laser chemical vapor deposition

Jun Endo, Akihiko Ito, Teiichi Kimura, Takashi Goto

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Abstract

Dense, dendritic and porous SiO2 films were prepared by laser chemical vapor deposition (LCVD) using a high-power continuous-wave mode Nd: YAG laser (206 W) and a TEOS (tetraethyl orthosilicate) precursor. The effects of laser power (PL) and total chamber pressure (Ptot) on the microstructure and deposition rate (Rdep) were investigated. Amorphous SiO2 films were obtained independent of PL and Ptot. Flame formation was observed between the nozzle and the substrate at PL > 160 W and Ptot > 15 kPa. At PL = 206 W, dense, dendritic and porous SiO2 films were obtained at Ptot < 20 kPa, Ptot = 23 kPa and Ptot > 25 kPa, respectively. The Rdep increased thousands of times under flame formation conditions, the highest Rdep being reached at 1200 μm h-1, 22,000 μm h-1 and 28,000 μm h-1 for the dense, dendritic and porous SiO2 films, respectively.

Original languageEnglish
Pages (from-to)225-229
Number of pages5
JournalMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume166
Issue number3
DOIs
Publication statusPublished - 2010 Feb 15

Keywords

  • Coating
  • Laser CVD
  • Microstructure
  • Silica

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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