High sensitive, miniaturized plano-convex quartz crystal microbalance fabricated by reactive ion etching and melting photoresist

Li Li, T. Abe, M. Esashi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

In this paper, high sensitive, miniaturized planoconvex quartz crystal microbalance (QCM) has been fabricated by reactive ion etching (RIE) and melting photoresist technology. Due to the convexity of the resonator surface and the small size of the excitation electrode, the energy of the oscillation is trapped at the center so that very little dissipation occurs at the edge. The fabricated plano-convex QCM has superior resonant characteristics compared with a QCM without the plano-convex formation. For example, the QCM with a high quality value (60000) was realized for a 1-mm-diameter electrode QCM with 1.6-μm-deep and 2-mm-diameter convex formation on both sides. A spurious mode around a fundamental vibration mode was also suppressed less than 20% from that before the etching. This technology is useful from a viewpoint of mass production because it needs not polishing.

Original languageEnglish
Title of host publicationTRANSDUCERS 2003 - 12th International Conference on Solid-State Sensors, Actuators and Microsystems, Digest of Technical Papers
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages508-511
Number of pages4
ISBN (Electronic)0780377311, 9780780377318
DOIs
Publication statusPublished - 2003 Jan 1
Event12th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2003 - Digest of Technical Papers - Boston, United States
Duration: 2003 Jun 82003 Jun 12

Publication series

NameTRANSDUCERS 2003 - 12th International Conference on Solid-State Sensors, Actuators and Microsystems, Digest of Technical Papers
Volume1

Other

Other12th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2003 - Digest of Technical Papers
CountryUnited States
CityBoston
Period03/6/803/6/12

Keywords

  • Chemical technology
  • Crystallization
  • Dry etching
  • Electrodes
  • Fabrication
  • Isolation technology
  • Resists
  • Rough surfaces
  • Surface roughness
  • Wet etching

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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