High-resolution rutherford backscattering spectroscopy for Nano-CMOS applications

Kenji Kimura, Zhao Ming, Kaoru Nakajima, Motofumi Suzuki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

A compact high-resolution RBS (HRBS) system, consisting of a simple magnetic spectrometer and a small accelerator, is used for Nano-CMOS applicstions. The HRBS system has several attractive features, e.g. capability of depth profiling with monolayer depth resolution, small footprint, reasonably short measuring time. Several examples of the applications are presented, which include observqation of high-k/Si interface using grazing-angl-esputtering- assisted HRBS, hydrogen depth profiling in gate dielectric films, and observation of Si emission from the SiO2/Si interface during oxidation of HfO2/SiO2/Si(001). These examples show that HRBS is a powerful tool for Nano-CMOS applications.

Original languageEnglish
Title of host publication2006 International Workshop on Nano CMOS - Proceedings, IWNC
Pages89-109
Number of pages21
DOIs
Publication statusPublished - 2006
Event1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006 - Mishima, Shizuoka, Japan
Duration: 2006 Jan 302006 Feb 1

Other

Other1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006
CountryJapan
CityMishima, Shizuoka
Period06/1/3006/2/1

Keywords

  • Grazing angle sputtering
  • HfO
  • High resolution RBS
  • Hydrogen
  • Interfacial layer
  • LaO
  • Nano CMOS
  • Si emission

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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