High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development

Masahiro Tomiki; Okihiro Sugihara; Hisashi Fujimura; Naomichi Okamoto

High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development

Masahiro Tomiki, Okihiro Sugihara, Hisashi Fujimura, Naomichi Okamoto

Institute of Multidisciplinary Research for Advanced Materials (IMRAM)

Research output: Contribution to journal › Article › peer-review

Abstract

A type of polyarylate (U100) with high glass-transition temperature (T_g: 193°C) has high optical transparency and thermal stability of refractive index and absorption. U100 can be processed by electron-beam (EB) exposure and thermal development. We study the optimum EB dose, temperature and time of thermal development, and film thickness, in order to achieve high-resolution processing in submicron size. We have successfully fabricated a high-resolution surface relief grating on the U100 thin film. The grating has the diffraction efficiency of 4.1%, and the efficiency did not change by heating for 100 h at 100°C.

Original language	English
Pages (from-to)	2538-2540
Number of pages	3
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	42
Issue number	4 B
Publication status	Published - 2003 Apr 1

Keywords

Electron beam
Polyarylate
Surface relief grating
Thermal development
Thermal stability
U100

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development. / Tomiki, Masahiro; Sugihara, Okihiro; Fujimura, Hisashi; Okamoto, Naomichi.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 42, No. 4 B, 01.04.2003, p. 2538-2540.

Research output: Contribution to journal › Article › peer-review

@article{61ae1a25ed0e465381e67abd9b581bd2,

title = "High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development",

abstract = "A type of polyarylate (U100) with high glass-transition temperature (Tg: 193°C) has high optical transparency and thermal stability of refractive index and absorption. U100 can be processed by electron-beam (EB) exposure and thermal development. We study the optimum EB dose, temperature and time of thermal development, and film thickness, in order to achieve high-resolution processing in submicron size. We have successfully fabricated a high-resolution surface relief grating on the U100 thin film. The grating has the diffraction efficiency of 4.1%, and the efficiency did not change by heating for 100 h at 100°C.",

keywords = "Electron beam, Polyarylate, Surface relief grating, Thermal development, Thermal stability, U100",

author = "Masahiro Tomiki and Okihiro Sugihara and Hisashi Fujimura and Naomichi Okamoto",

year = "2003",

month = apr,

day = "1",

language = "English",

volume = "42",

pages = "2538--2540",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "4 B",

}

TY - JOUR

T1 - High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development

AU - Tomiki, Masahiro

AU - Sugihara, Okihiro

AU - Fujimura, Hisashi

AU - Okamoto, Naomichi

PY - 2003/4/1

Y1 - 2003/4/1

N2 - A type of polyarylate (U100) with high glass-transition temperature (Tg: 193°C) has high optical transparency and thermal stability of refractive index and absorption. U100 can be processed by electron-beam (EB) exposure and thermal development. We study the optimum EB dose, temperature and time of thermal development, and film thickness, in order to achieve high-resolution processing in submicron size. We have successfully fabricated a high-resolution surface relief grating on the U100 thin film. The grating has the diffraction efficiency of 4.1%, and the efficiency did not change by heating for 100 h at 100°C.

AB - A type of polyarylate (U100) with high glass-transition temperature (Tg: 193°C) has high optical transparency and thermal stability of refractive index and absorption. U100 can be processed by electron-beam (EB) exposure and thermal development. We study the optimum EB dose, temperature and time of thermal development, and film thickness, in order to achieve high-resolution processing in submicron size. We have successfully fabricated a high-resolution surface relief grating on the U100 thin film. The grating has the diffraction efficiency of 4.1%, and the efficiency did not change by heating for 100 h at 100°C.

KW - Electron beam

KW - Polyarylate

KW - Surface relief grating

KW - Thermal development

KW - Thermal stability

KW - U100

UR - http://www.scopus.com/inward/record.url?scp=0038346794&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0038346794&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0038346794

VL - 42

SP - 2538

EP - 2540

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 4 B

ER -

High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development

Abstract

Keywords

ASJC Scopus subject areas

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