High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development

Masahiro Tomiki, Okihiro Sugihara, Hisashi Fujimura, Naomichi Okamoto

Research output: Contribution to journalArticle

Abstract

A type of polyarylate (U100) with high glass-transition temperature (Tg: 193°C) has high optical transparency and thermal stability of refractive index and absorption. U100 can be processed by electron-beam (EB) exposure and thermal development. We study the optimum EB dose, temperature and time of thermal development, and film thickness, in order to achieve high-resolution processing in submicron size. We have successfully fabricated a high-resolution surface relief grating on the U100 thin film. The grating has the diffraction efficiency of 4.1%, and the efficiency did not change by heating for 100 h at 100°C.

Original languageEnglish
Pages (from-to)2538-2540
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume42
Issue number4 B
Publication statusPublished - 2003 Apr 1

Keywords

  • Electron beam
  • Polyarylate
  • Surface relief grating
  • Thermal development
  • Thermal stability
  • U100

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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