High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development

Masahiro Tomiki; Okihiro Sugihara; Hisashi Fujimura; Naomichi Okamoto

doi:10.1143/jjap.42.2538

High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development

Masahiro Tomiki, Okihiro Sugihara, Hisashi Fujimura, Naomichi Okamoto

Research output: Contribution to journal › Article › peer-review

Abstract

A type of polyarylate (U100) with high glass-transition temperature (T_g: 193°C) has high optical transparency and thermal stability of refractive index and absorption. U100 can be processed by electron-beam (EB) exposure and thermal development. We study the optimum EB dose, temperature and time of thermal development, and film thickness, in order to achieve high-resolution processing in submicron size. We have successfully fabricated a high-resolution surface relief grating on the U100 thin film. The grating has the diffraction efficiency of 4.1%, and the efficiency did not change by heating for 100 h at 100°C.

Original language	English
Pages (from-to)	2538-2540
Number of pages	3
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	42
Issue number	4 B
DOIs	https://doi.org/10.1143/jjap.42.2538
Publication status	Published - 2003 Apr
Externally published	Yes

Keywords

Electron beam
Polyarylate
Surface relief grating
Thermal development
Thermal stability
U100

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/jjap.42.2538

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High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development. / Tomiki, Masahiro; Sugihara, Okihiro; Fujimura, Hisashi; Okamoto, Naomichi.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 42, No. 4 B, 04.2003, p. 2538-2540.

Research output: Contribution to journal › Article › peer-review

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abstract = "A type of polyarylate (U100) with high glass-transition temperature (Tg: 193°C) has high optical transparency and thermal stability of refractive index and absorption. U100 can be processed by electron-beam (EB) exposure and thermal development. We study the optimum EB dose, temperature and time of thermal development, and film thickness, in order to achieve high-resolution processing in submicron size. We have successfully fabricated a high-resolution surface relief grating on the U100 thin film. The grating has the diffraction efficiency of 4.1%, and the efficiency did not change by heating for 100 h at 100°C.",

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AB - A type of polyarylate (U100) with high glass-transition temperature (Tg: 193°C) has high optical transparency and thermal stability of refractive index and absorption. U100 can be processed by electron-beam (EB) exposure and thermal development. We study the optimum EB dose, temperature and time of thermal development, and film thickness, in order to achieve high-resolution processing in submicron size. We have successfully fabricated a high-resolution surface relief grating on the U100 thin film. The grating has the diffraction efficiency of 4.1%, and the efficiency did not change by heating for 100 h at 100°C.

KW - Electron beam

KW - Polyarylate

KW - Surface relief grating

KW - Thermal development

KW - Thermal stability

KW - U100

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High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development

Abstract

Keywords

ASJC Scopus subject areas

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