Abstract
A type of polyarylate (U100) with high glass-transition temperature (Tg: 193°C) has high optical transparency and thermal stability of refractive index and absorption. U100 can be processed by electron-beam (EB) exposure and thermal development. We study the optimum EB dose, temperature and time of thermal development, and film thickness, in order to achieve high-resolution processing in submicron size. We have successfully fabricated a high-resolution surface relief grating on the U100 thin film. The grating has the diffraction efficiency of 4.1%, and the efficiency did not change by heating for 100 h at 100°C.
| Original language | English |
|---|---|
| Pages (from-to) | 2538-2540 |
| Number of pages | 3 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 42 |
| Issue number | 4 B |
| Publication status | Published - 2003 Apr 1 |
Keywords
- Electron beam
- Polyarylate
- Surface relief grating
- Thermal development
- Thermal stability
- U100
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)
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Tomiki, M., Sugihara, O., Fujimura, H., & Okamoto, N. (2003). High resolution in heat-resistant optical polymer by electron-beam exposure and thermal development. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 42(4 B), 2538-2540.