High resolution-high energy x-ray photoelectron spectroscopy using third-generation synchrotron radiation source, and its application to Si-high k insulator systems

K. Kobayashi; M. Yabashi; Y. Takata; T. Tokushima; S. Shin; K. Tamasaku; D. Miwa; T. Ishikawa; H. Nohira; T. Hattori; Y. Sugita; O. Nakatsuka; A. Sakai; S. Zaima

doi:10.1063/1.1595714

High resolution-high energy x-ray photoelectron spectroscopy using third-generation synchrotron radiation source, and its application to Si-high k insulator systems

K. Kobayashi, M. Yabashi, Y. Takata, T. Tokushima, S. Shin, K. Tamasaku, D. Miwa, T. Ishikawa, H. Nohira, T. Hattori, Y. Sugita, O. Nakatsuka, A. Sakai, S. Zaima

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342 Citations (Scopus)

Abstract

High-resolution X-ray photoelectron spectroscopy at 6 keV photon energy was realized by utilizing high-flux-density x rays from the third-generation high-energy synchrotron radiation facility, SPring-8. The method was applied to high-k HfO₂/interlayer/Si complementary metal oxide superconductor gate-dielectric structures. Results indicated that SiO_xN_y as an interlayer was more effective in controlling the interface structure than SiO₂.

Original language	English
Pages (from-to)	1005-1007
Number of pages	3
Journal	Applied Physics Letters
Volume	83
Issue number	5
DOIs	https://doi.org/10.1063/1.1595714
Publication status	Published - 2003 Aug 4

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.1595714

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Kobayashi, K., Yabashi, M., Takata, Y., Tokushima, T., Shin, S., Tamasaku, K., Miwa, D., Ishikawa, T., Nohira, H., Hattori, T., Sugita, Y., Nakatsuka, O., Sakai, A., & Zaima, S. (2003). High resolution-high energy x-ray photoelectron spectroscopy using third-generation synchrotron radiation source, and its application to Si-high k insulator systems. Applied Physics Letters, 83(5), 1005-1007. https://doi.org/10.1063/1.1595714

Kobayashi, K, Yabashi, M, Takata, Y, Tokushima, T, Shin, S, Tamasaku, K, Miwa, D, Ishikawa, T, Nohira, H, Hattori, T, Sugita, Y, Nakatsuka, O, Sakai, A & Zaima, S 2003, 'High resolution-high energy x-ray photoelectron spectroscopy using third-generation synchrotron radiation source, and its application to Si-high k insulator systems', Applied Physics Letters, vol. 83, no. 5, pp. 1005-1007. https://doi.org/10.1063/1.1595714

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AU - Kobayashi, K.

AU - Yabashi, M.

AU - Takata, Y.

AU - Tokushima, T.

AU - Shin, S.

AU - Tamasaku, K.

AU - Miwa, D.

AU - Ishikawa, T.

AU - Nohira, H.

AU - Hattori, T.

AU - Sugita, Y.

AU - Nakatsuka, O.

AU - Sakai, A.

AU - Zaima, S.

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High resolution-high energy x-ray photoelectron spectroscopy using third-generation synchrotron radiation source, and its application to Si-high k insulator systems

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