High resolution hard X-ray photoemission using synchrotron radiation as an essential tool for characterization of thin solid films

J. J. Kim, E. Ikenaga, M. Kobata, A. Takeuchi, M. Awaji, H. Makino, P. P. Chen, A. Yamamoto, T. Matsuoka, D. Miwa, Y. Nishino, T. Yamamoto, T. Yao, K. Kobayashi

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Abstract

Recently, we have shown that hard X-ray photoemission spectroscopy using undulator X-rays at SPring-8 is quite feasible with both high resolution and high throughput. Here we report an application of hard X-ray photoemission spectroscopy to the characterization of electronic and chemical states of thin solid films, for which conventional PES is not applicable. As a typical example, we focus on the problem of the scatter in the reported band-gap values for InN. We show that oxygen incorporation into the InN film strongly modifies the valence and plays a crucial role in the band gap problem. The present results demonstrate the powerful applicability of high resolution photoemission spectroscopy with hard X-rays from a synchrotron source.

Original languageEnglish
Pages (from-to)5602-5606
Number of pages5
JournalApplied Surface Science
Volume252
Issue number15
DOIs
Publication statusPublished - 2006 May 30

Keywords

  • High resolution hard X-ray photoemission spectroscopy
  • InN
  • Oxygen incorporation

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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