High-quality silicon oxide film formed by diffusion region plasma enhanced chemical vapor deposition and oxygen radical treatment using microwave-excited high-density plasma

Hiroaki Tanaka, Zhong Chuanjie, Yukio Hayakawa, Masaki Hirayama, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi

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24 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy