High-quality epitaxial TiO2 thin films grown on α-Al2O3 substrates by pulsed laser deposition

R. Shinohara, T. Yamaki, S. Yamamoto, H. Itoh, K. Asai

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


Epitaxial TiO2 rutile films were grown at 200, 400 and 600°C by pulsed laser deposition (PLD) and their orientations were controlled by the use of α-Al2O3 (1000) and (101̄0) substrates. The crystallinity of the films grown at 600°C was higher than that of films deposited by other methods.

Original languageEnglish
Pages (from-to)967-969
Number of pages3
JournalJournal of Materials Science Letters
Issue number12
Publication statusPublished - 2002 Jun 15
Externally publishedYes

ASJC Scopus subject areas

  • Materials Science(all)

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