High-power, low-pressure, inductively coupled RF plasma source using a FET-based inverter power supply

Shota Komizunai, Kohei Oikawa, Yuta Saito, Kazunori Takahashi, Akira Ando

Research output: Contribution to journalArticle

Abstract

A high-density plasma of density greater than 1019m-3 is successfully produced in 1.5 Pa argon by an inductively coupled RF discharge with a 70- mm-diameter source cavity, where a 10-turn water-cooled RF loop antenna is wound onto the source tube and an axial magnetic field of ∼70G is applied by two solenoids to reduce plasma loss onto the source cavity. The RF antenna is powered from a frequency-tunable field-effect-transistorbased inverter power supply, which does not require variable capacitors to match the impedance, at a frequency of ∼350 kHz and the RF power can be increased up to ∼8 kW. It is also demonstrated that the source is operational with an axial magnetic field provided by permanent magnet (PM) arrays; then the density in the case of the PM arrays is higher than that in the case of the solenoids. The role of the magnetic filter downstream of the source tube is demonstrated; a radially uniform plasma density exceeding 1018m-3 and an electron temperature of ∼1-2 eV are obtained at ∼100mm downstream of the open exit of the source tube.

Original languageEnglish
Article number01AA08
JournalJapanese journal of applied physics
Volume54
Issue number1 Supplement
DOIs
Publication statusPublished - 2015 Jan 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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