High-performance wet cleaning technology: O2-free wafer-cleaning technology

Akinobu Teramoto

Research output: Chapter in Book/Report/Conference proceedingChapter

Original languageEnglish
Title of host publicationScientific Wet Process Technology for Innovative LSI/FPD Manufacturing
PublisherCRC Press
Pages79-86
Number of pages8
ISBN (Electronic)9781315221076
ISBN (Print)9780849335433
Publication statusPublished - 2016 Apr 19

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Engineering(all)
  • Environmental Science(all)

Cite this

Teramoto, A. (2016). High-performance wet cleaning technology: O2-free wafer-cleaning technology. In Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing (pp. 79-86). CRC Press.