High-performance and damage-free neutral beam etching

S. Samukawa, K. Sakamoto, K. Ichiki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We propose high efficient neutral beam generation by using negative ions in a neutral beam source. We found that high flux and low energy neutral beams could be generated by efficiently neutralizing negative ions in the pulsed ICP passing through a carbon plate having high aspect ratio apertures. We expect that accurate, damage-free etching processes can be achieved by using our newly developed neutral beam generation system.

Original languageEnglish
Title of host publication2002 7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002
EditorsCalvin T. Gabriel, Terence Hook, Koji Eriguchi
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages126-129
Number of pages4
ISBN (Electronic)0965157776
DOIs
Publication statusPublished - 2002 Jan 1
Event7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002 - Maui, United States
Duration: 2002 Jun 52002 Jun 7

Publication series

NameInternational Symposium on Plasma Process-Induced Damage, P2ID, Proceedings
Volume2002-January

Other

Other7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002
CountryUnited States
CityMaui
Period02/6/502/6/7

Keywords

  • Acceleration
  • Apertures
  • Electrons
  • Etching
  • Particle beams
  • Plasma accelerators
  • Plasma applications
  • Plasma measurements
  • Plasma sources
  • Plasma x-ray sources

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Condensed Matter Physics

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