High mobility of surface atoms and induced uniaxial anisotropy in very thin permalloy films

H. Katada, T. Shimatsu, H. Watanabe, I. Watanabe, H. Muraoka, Y. Nakamura, Y. Sugita

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The value of Hk in very thin Permalloy or CoZrNb films, sandwiched by seed and protective Ta or Cu layers, decreases as the thickness decreases below 20 nm, indicating that the Hk reduction is independent on the material, the surface energy, or crystal structure of the seed and protective layers. In this study, the temperature dependence of Ku in very thin Permalloy films was measured to examine the surface effect on induced uniaxial anisotropy.

Original languageEnglish
Title of host publicationINTERMAG Europe 2002 - IEEE International Magnetics Conference
EditorsJ. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, Jo De Boeck, R. Wood
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)0780373650, 9780780373655
DOIs
Publication statusPublished - 2002 Jan 1
Event2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 - Amsterdam, Netherlands
Duration: 2002 Apr 282002 May 2

Publication series

NameINTERMAG Europe 2002 - IEEE International Magnetics Conference

Other

Other2002 IEEE International Magnetics Conference, INTERMAG Europe 2002
CountryNetherlands
CityAmsterdam
Period02/4/2802/5/2

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Surfaces, Coatings and Films

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