High-frequency characterization of intrinsic FinFET channel

H. Sakai, S. O'Uchi, T. Matsukawa, K. Endo, Y. X. Liu, T. Tsukada, Y. Ishikawa, T. Nakagawa, T. Sekigawa, H. Koike, K. Sakamoto, M. Masahara, H. Ishikuro

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)
Original languageEnglish
Title of host publication2010 IEEE International SOI Conference, SOI 2010
DOIs
Publication statusPublished - 2010 Dec 30
Externally publishedYes
Event2010 IEEE International Silicon on Insulator Conference, SOI 2010 - San Diego, CA, United States
Duration: 2010 Oct 112010 Oct 14

Publication series

NameProceedings - IEEE International SOI Conference
ISSN (Print)1078-621X

Other

Other2010 IEEE International Silicon on Insulator Conference, SOI 2010
CountryUnited States
CitySan Diego, CA
Period10/10/1110/10/14

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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