High Flux Density Silicon-Iron Ribbons

K. I. Arai, N. Tsuya, K. Ohmori, Takashi Matsuoka, H. Shimanaka

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Silicon iron ribbons with silicon concentration lower than 4 wt% were prepared by a rapid quenching roll method, and the size of ribbons obtained were 2 ∽4 mm in width and 40∽60 μm in thickness. The grains grew to about 2 mm and the ribbons had (100)[0kl] cube-on-face grain textures after annealing the ribbons in vacuum atmosphere. The coercive force of the 2. 5Si. 97. 5Fe ribbon was decreased to 60 mOe by annealing at 1160°C for 2 hours at the pressure of 6x10-3 Torr.

Original languageEnglish
Pages (from-to)1418-1420
Number of pages3
JournalIEEE Transactions on Magnetics
Volume18
Issue number6
DOIs
Publication statusPublished - 1982 Jan 1
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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