High-efficiency PFC abatement system utilizing plasma decomposition and Ca(OH)2/CaO immobilization

Katsumasa Suzuki, Yoshio Ishihara, Kaoru Sakoda, Yasuyuki Shirai, Akinobu Teramoto, Masaki Hirayama, Tadahiro Ohmi, Takayuki Watanabe, Takashi Ito

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

In order to minimize contributions to global warming, it is important to develop a perfluorocompound (PFC) abatement system that can remove PFCs effectively with low electric power. We have developed a new PFC abatement system consisting mainly of a 2-MHz ICP plasma source and two Ca(OH) 2/CaO columns operated under a decompression pressure. Reactive fluorinated compounds including SiF4 are immobilized in the Ca(OH)2/CaO columns without a water scrubber. Stable compounds such as CF4 are excited by the 2-MHz ICP plasma. When the emissions from an Si oxidation film etching process chamber were treated by this abatement system, F2 equivalent removal efficiency was 99.6%, which was about one order of magnitude larger than that of a conventional abatement system. But the CO2 equivalent removal efficiency was calculated to be 91.4% because over 95% of CO2 equivalent emissions were caused by the plasma source power consumption of 2.4 kWh. It means that minimization of the plasma source power consumption, depending on PFC emissions, is a very effective method of minimizing contributions to global warming in a manner similar to improving the PFC removal efficiency.

Original languageEnglish
Article number4657432
Pages (from-to)668-675
Number of pages8
JournalIEEE Transactions on Semiconductor Manufacturing
Volume21
Issue number4
DOIs
Publication statusPublished - 2008 Nov 1

Keywords

  • Abatement
  • Calcium
  • Plasma

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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