High-aspect-ratio aluminum-doped zinc oxide nanomechanical resonator

Research output: Contribution to journalLetterpeer-review

Abstract

This paper reports on the patterning of a high-aspect-ratio aluminum-doped zinc oxide (AZO) capacitive resonator based on the combination of the deep reactive ion etching (deep RIE) and atomic layer deposition (ALD) processes. The suspended AZO capacitive resonator is successfully demonstrated. Its resonant frequency is observed at 10.4 kHz with a quality factor (Q factor) of approximately 500 in a vacuum chamber.

Original languageEnglish
Pages (from-to)S141-S142
JournalIEEJ Transactions on Electrical and Electronic Engineering
Volume12
DOIs
Publication statusPublished - 2017 Dec

Keywords

  • aluminum-doped zinc oxide
  • atomic layer deposition
  • deep reactive ion etching
  • nanomechanical structure

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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