Heated ion implantation technology for highly reliable metal-gate/high-k CMOS SOI FinFETs

W. Mizubayashi, H. Onoda, Y. Nakashima, Y. Ishikawa, T. Matsukawa, K. Endo, Y. X. Liu, S. O'Uchi, J. Tsukada, H. Yamauchi, S. Migita, Y. Morita, H. Ota, M. Masahara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

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Chemical Compounds

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Physics & Astronomy