Growth of ZnO nanowires in hollow-type magnetron O2/Ar RF plasma

Hideki Ono, Satoru Iizuka

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

In this study we investigate how the sputtering of zinc from a zinc target is influenced by the properties of O2/Ar plasma when the discharge parameters such as gas pressure ratio and target bias voltage are changed. We also investigate plasma conditions for the formation of ZnO nanowires that are created and deposited on the substrate. We found that a plasma condition with strong optical emission from Zn neutrals is an important factor for the deposition of ZnO nanowires. Both the growth of nanowires and the emission intensity from Zn strongly depend on the partial pressure of oxygen.

Original languageEnglish
Pages (from-to)1016-1019
Number of pages4
JournalThin Solid Films
Volume518
Issue number3
DOIs
Publication statusPublished - 2009 Dec 30

Keywords

  • Magnetron plasma
  • Nanowire
  • Sputtering
  • ZnO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Growth of ZnO nanowires in hollow-type magnetron O<sub>2</sub>/Ar RF plasma'. Together they form a unique fingerprint.

Cite this