Growth of GaN on nitriding TiN buffer layers

Teppei Watanabe, Kazuhiro Ito, Susumu Tsukimoto, Yasuhisa Ushida, Miki Moriyama, Naoki Shibata, Masanori Murakami

    Research output: Contribution to journalArticlepeer-review

    10 Citations (Scopus)

    Abstract

    The breakthrough of GaN epitaxial layer growth with mirror-like surface on the sapphire substrate using a MOCVD (metal organic chemical vapor deposition) technique was made by discovery of an AlN buffer layer prior to GaN deposition about 20 years ago. Since then, extensive efforts have been made to develop a conductive substrate for MOCVD grown GaN layers. In the present study, we explored a possibility of growing continuous, flat GaN layers on a metallic TiN buffer layer, and focused our experiments to investigate the effect of nitrogen contents of the TiN buffer layers on lateral growth of the GaN layers. It was concluded that nitrogen composition in the TiN buffer layers should be higher than that of stoichiometric TiN to grow smooth GaN layers. It was found that nitriding the TiN buffer layers after deposition enriched significantly the nitrogen content compared with increasing the ratio of N2 to N 2 + Ar (N2/(N2 + Ar) ratio) during TiN deposition. Choice of the moderate N2/(N2 + Ar) ratio during TiN deposition and nitriding the TiN buffer layers after TiN deposition were essential to grow continuous, flat GaN layers, since the reduction of the N2/(N2 + Ar) ratio promoted few opening areas in the GaN layers.

    Original languageEnglish
    Pages (from-to)1975-1978
    Number of pages4
    JournalMaterials Transactions
    Volume46
    Issue number9
    DOIs
    Publication statusPublished - 2005 Sep

    Keywords

    • Epitaxial growth
    • Growth of GaN
    • Nitriding
    • Nitrogen content
    • TiN buffer layers

    ASJC Scopus subject areas

    • Materials Science(all)
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering

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