Growth of atomically flat nanofilms and surface superstructures of intrinsic liquid alloys

Toshiro Yamanaka, Jian Li Wang, Tadaaki Nagao, Shin Yaginuma, Canhua Liu, Andrey V. Tupkalo, Toshio Sakurai

    Research output: Contribution to journalArticle

    Abstract

    Atomically flat nanofilms were formed during growth of Ga on a Si(111) surface using an In surfactant above the melting point of Ga (and In-Ga eutectic) throughout Ga coverages of 0.17 to 5 monolayers (0.17≤ Ga ≤5). Unique superstructures such as a quasisquare-lattice (QS) structure at Ga =3 to 4 and a 5×5 structure at Ga =5 appeared as Ga increased. The QS structure had Ga dimer layers similar to the square lattices of an alpha-Ga(100) plane but also maintained the 1×1 structure of Si(111). As dimer layers transformed into a monoatomic layer, QS transformed into a 5×5 structure that no longer has square features.

    Original languageEnglish
    Article number143116
    JournalApplied Physics Letters
    Volume92
    Issue number14
    DOIs
    Publication statusPublished - 2008 Apr 21

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

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  • Cite this

    Yamanaka, T., Wang, J. L., Nagao, T., Yaginuma, S., Liu, C., Tupkalo, A. V., & Sakurai, T. (2008). Growth of atomically flat nanofilms and surface superstructures of intrinsic liquid alloys. Applied Physics Letters, 92(14), [143116]. https://doi.org/10.1063/1.2908930