Growth of 130 μm thick epitaxial KNbO3 film by hydrothermal method

T. Shiraishi, H. Einishi, M. Ishikawa, T. Hasegawa, M. Kurosawa, H. Funakubo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Citations (Scopus)

Abstract

KNbO3 thick films were deposited on (100)c SrRuO 3//(100)SrTiO3 substrates at 240°C for 3 h by hydrothermal method. Film thickness increased linearly with increasing the deposition number of times and 130 μm thickness was achieved by the 6 time deposition. XRD analysis showed the growth of epitaxial orthorhombic films with the mixture orientation of (100), (010) and (001). Cross-sectional SEM observation showed that the 130 μm-thick film was dense and no obvious voids inside the film. In addition, the crystal structure change along film thickness direction was not detected from the cross-sectional Raman spectral observation.

Original languageEnglish
Title of host publicationOxide Semiconductors and Thin Films
Pages291-296
Number of pages6
DOIs
Publication statusPublished - 2013 Dec 10
Externally publishedYes
Event2012 MRS Fall Meeting - Boston, MA, United States
Duration: 2012 Nov 252012 Nov 30

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1494
ISSN (Print)0272-9172

Other

Other2012 MRS Fall Meeting
CountryUnited States
CityBoston, MA
Period12/11/2512/11/30

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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