Growth of 130 μm thick epitaxial KNbO3 film by hydrothermal method

T. Shiraishi, H. Einishi, M. Ishikawa, T. Hasegawa, M. Kurosawa, H. Funakubo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

9 Citations (Scopus)


KNbO3 thick films were deposited on (100)c SrRuO 3//(100)SrTiO3 substrates at 240°C for 3 h by hydrothermal method. Film thickness increased linearly with increasing the deposition number of times and 130 μm thickness was achieved by the 6 time deposition. XRD analysis showed the growth of epitaxial orthorhombic films with the mixture orientation of (100), (010) and (001). Cross-sectional SEM observation showed that the 130 μm-thick film was dense and no obvious voids inside the film. In addition, the crystal structure change along film thickness direction was not detected from the cross-sectional Raman spectral observation.

Original languageEnglish
Title of host publicationOxide Semiconductors and Thin Films
Number of pages6
Publication statusPublished - 2013
Externally publishedYes
Event2012 MRS Fall Meeting - Boston, MA, United States
Duration: 2012 Nov 252012 Nov 30

Publication series

NameMaterials Research Society Symposium Proceedings
ISSN (Print)0272-9172


Other2012 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


Dive into the research topics of 'Growth of 130 μm thick epitaxial KNbO3 film by hydrothermal method'. Together they form a unique fingerprint.

Cite this