Grown-facet-dependent characteristics of silicon-on-insulator by lateral solid phase epitaxy

K. Kusukawa, M. Moniwa, E. Murakami, T. Warabisako, M. Miyao

    Research output: Contribution to journalArticlepeer-review

    10 Citations (Scopus)

    Abstract

    Electrical characteristics of Si layers on SiO2 formed by seeded lateral solid phase epitaxy are evaluated using metal-oxide-semiconductor field-effect transistors (MOSFET's) fabricated in the layer. To evaluate the {110} and {111} facet grown areas separately, the locations of the MOSFET's are varied as a function of distance from the seeding region. Significant differences in electrical characteristics of the MOSFET's are observed depending on the single-crystal growth mode. A field-effect (electron) mobility of about 700 cm2/(V s) was obtained for n-channel MOSFET's fabricated in the {110} facet grown region. That for the {111} facet growth region was inadequate. The results indicate the possibility of applying the method for future three-dimensional device structures using a {110} facet grown region.

    Original languageEnglish
    Pages (from-to)1681-1683
    Number of pages3
    JournalApplied Physics Letters
    Volume52
    Issue number20
    DOIs
    Publication statusPublished - 1988 Dec 1

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

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