TY - JOUR
T1 - Grazing-exit electron probe X-ray microanalysis of ultra-thin films and single particles with high-angle resolution
AU - Spolnik, Zoya
AU - Zhang, Jing
AU - Wagatsuma, Kazuaki
AU - Tsuji, Kouichi
N1 - Funding Information:
Z. Spolnik was financially supported by the Japan Society for Promotion of Science (JSPS). We would like to thank Mr. F. Sakamoto (IMR, Tohoku University) for the ICP–AES measurements. Part of this work was financially supported by JSPS Grant-in-Aid (C-11650827 and B-12554030) and by the Shimadzu Science Foundation. This work was performed under the research programs (Nos. 234 and 313) at the Laboratory for Advanced Materials, Institute for Materials Research, Tohoku University. We wish to thank Dr. H.T. Chen for the help in sample collection on board during a recent National “973” Research Program (G1999043705) to the Yellow Sea.
PY - 2002/3/25
Y1 - 2002/3/25
N2 - Ultra-thin metallic films, artificial particles and aerosols were analyzed by grazing-exit electron probe X-ray microanalysis (GE-EPMA). It is beneficial to measure the characteristic intensity emitted from these specimens at very small exit angles. Such an approach reduces the high background originated from the substrate. The reduction of background X-rays is very important for thin film analysis. Therefore, it is shown that GE-EPMA is a powerful tool for localized analysis of thin-films and the surface of the sample. It is also found that GE-EPMA solves the problem of the overlapping of X-ray lines emitted from the substrate and the particle or the aerosol. Performing the measurement of the characteristic radiation from the particle under grazing exit conditions allows particles smaller than the electron beam diameter to be analyzed. Thus any limitations of the electron beam size can be removed.
AB - Ultra-thin metallic films, artificial particles and aerosols were analyzed by grazing-exit electron probe X-ray microanalysis (GE-EPMA). It is beneficial to measure the characteristic intensity emitted from these specimens at very small exit angles. Such an approach reduces the high background originated from the substrate. The reduction of background X-rays is very important for thin film analysis. Therefore, it is shown that GE-EPMA is a powerful tool for localized analysis of thin-films and the surface of the sample. It is also found that GE-EPMA solves the problem of the overlapping of X-ray lines emitted from the substrate and the particle or the aerosol. Performing the measurement of the characteristic radiation from the particle under grazing exit conditions allows particles smaller than the electron beam diameter to be analyzed. Thus any limitations of the electron beam size can be removed.
KW - Aerosol
KW - Grazing-exit electron probe X-ray microanalysis
KW - Localized analysis of thin-films
KW - Ultra-thin films
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U2 - 10.1016/S0003-2670(01)01601-4
DO - 10.1016/S0003-2670(01)01601-4
M3 - Article
AN - SCOPUS:0037170686
SN - 0003-2670
VL - 455
SP - 245
EP - 252
JO - Analytica Chimica Acta
JF - Analytica Chimica Acta
IS - 2
ER -