Gray-scale lithography using mask-less exposure system

Kentaro Totsu, Kenta Fujishiro, Shuji Tanaka, Masayoshi Esashi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

A fabrication process of precisely controlled three-dimensional patterns using a gray-scale lithography is presented. Multi-layered exposure patterns digitally generated by a mask-less exposure system are superposed on a photoresist-coated substrate layer by layer. Changing the exposure patterns and the exposure time of each exposure make the precise control of the profile of ultraviolet dose possible. The mask-less exposure system realizes fabrication of variable three-dimensional patterns at low cost with saving time. Photoresist patterns of spherical and aspherical microlens array of 100 μm in each diameter are fabricated. The patterns are successfully transferred into silicon substrates with reactive ion etching.

Original languageEnglish
Title of host publicationTRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers
Pages1441-1444
Number of pages4
DOIs
Publication statusPublished - 2005 Nov 9
Event13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05 - Seoul, Korea, Republic of
Duration: 2005 Jun 52005 Jun 9

Publication series

NameDigest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05
Volume2

Other

Other13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05
CountryKorea, Republic of
CitySeoul
Period05/6/505/6/9

Keywords

  • 3D
  • Gray-scale
  • Mask-less
  • Microlens
  • Photolithography

ASJC Scopus subject areas

  • Engineering(all)

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