Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media

Satoru Yoshimura, D. D. Djayaprawira, Tham Kim Kong, Yusuke Masuda, Hiroki Shoji, Migaku Takahashi

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

To decrease grain size and grain size distribution in CoCr15Ta3.5Ni10Pt5/Cr longitudinal thin film media, a very thin CrW54 seedlayer combined with a dry-etching process were utilized. In the media dry etched after CrW54 deposition, utilization of 1.5 nm CrW54 reduces the grain diameter and σ to 9.4 and 2.2 nm, respectively. By optimizing CrW54 seedlayer thickness and dry-etching process, grain diameter and σ of the magnetic layer can be reduced while maintaining coercivity, longitudinal orientation of magnetic grains, and magnetic interactions.

Original languageEnglish
Pages (from-to)6860-6862
Number of pages3
JournalJournal of Applied Physics
Volume87
Issue number9 III
Publication statusPublished - 2000 May 1

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media'. Together they form a unique fingerprint.

  • Cite this

    Yoshimura, S., Djayaprawira, D. D., Kong, T. K., Masuda, Y., Shoji, H., & Takahashi, M. (2000). Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media. Journal of Applied Physics, 87(9 III), 6860-6862.