Abstract
To decrease grain size and grain size distribution in CoCr15Ta3.5Ni10Pt5/Cr longitudinal thin film media, a very thin CrW54 seedlayer combined with a dry-etching process were utilized. In the media dry etched after CrW54 deposition, utilization of 1.5 nm CrW54 reduces the grain diameter and σ to 9.4 and 2.2 nm, respectively. By optimizing CrW54 seedlayer thickness and dry-etching process, grain diameter and σ of the magnetic layer can be reduced while maintaining coercivity, longitudinal orientation of magnetic grains, and magnetic interactions.
| Original language | English |
|---|---|
| Pages (from-to) | 6860-6862 |
| Number of pages | 3 |
| Journal | Journal of Applied Physics |
| Volume | 87 |
| Issue number | 9 III |
| Publication status | Published - 2000 May 1 |
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Physics and Astronomy (miscellaneous)
Fingerprint Dive into the research topics of 'Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media'. Together they form a unique fingerprint.
Cite this
Yoshimura, S., Djayaprawira, D. D., Kong, T. K., Masuda, Y., Shoji, H., & Takahashi, M. (2000). Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media. Journal of Applied Physics, 87(9 III), 6860-6862.