Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media

Satoru Yoshimura; D. D. Djayaprawira; Tham Kim Kong; Yusuke Masuda; Hiroki Shoji; Migaku Takahashi

Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media

Satoru Yoshimura, D. D. Djayaprawira, Tham Kim Kong, Yusuke Masuda, Hiroki Shoji, Migaku Takahashi

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

To decrease grain size and grain size distribution in CoCr₁₅Ta_3.5Ni₁₀Pt₅/Cr longitudinal thin film media, a very thin CrW₅₄ seedlayer combined with a dry-etching process were utilized. In the media dry etched after CrW₅₄ deposition, utilization of 1.5 nm CrW₅₄ reduces the grain diameter and σ to 9.4 and 2.2 nm, respectively. By optimizing CrW₅₄ seedlayer thickness and dry-etching process, grain diameter and σ of the magnetic layer can be reduced while maintaining coercivity, longitudinal orientation of magnetic grains, and magnetic interactions.

Original language	English
Pages (from-to)	6860-6862
Number of pages	3
Journal	Journal of Applied Physics
Volume	87
Issue number	9 III
Publication status	Published - 2000 May 1

ASJC Scopus subject areas

Physics and Astronomy(all)
Physics and Astronomy (miscellaneous)

Cite this

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title = "Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media",

abstract = "To decrease grain size and grain size distribution in CoCr15Ta3.5Ni10Pt5/Cr longitudinal thin film media, a very thin CrW54 seedlayer combined with a dry-etching process were utilized. In the media dry etched after CrW54 deposition, utilization of 1.5 nm CrW54 reduces the grain diameter and σ to 9.4 and 2.2 nm, respectively. By optimizing CrW54 seedlayer thickness and dry-etching process, grain diameter and σ of the magnetic layer can be reduced while maintaining coercivity, longitudinal orientation of magnetic grains, and magnetic interactions.",

author = "Satoru Yoshimura and Djayaprawira, {D. D.} and Kong, {Tham Kim} and Yusuke Masuda and Hiroki Shoji and Migaku Takahashi",

year = "2000",

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T1 - Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media

AU - Yoshimura, Satoru

AU - Djayaprawira, D. D.

AU - Kong, Tham Kim

AU - Masuda, Yusuke

AU - Shoji, Hiroki

AU - Takahashi, Migaku

PY - 2000/5/1

Y1 - 2000/5/1

N2 - To decrease grain size and grain size distribution in CoCr15Ta3.5Ni10Pt5/Cr longitudinal thin film media, a very thin CrW54 seedlayer combined with a dry-etching process were utilized. In the media dry etched after CrW54 deposition, utilization of 1.5 nm CrW54 reduces the grain diameter and σ to 9.4 and 2.2 nm, respectively. By optimizing CrW54 seedlayer thickness and dry-etching process, grain diameter and σ of the magnetic layer can be reduced while maintaining coercivity, longitudinal orientation of magnetic grains, and magnetic interactions.

AB - To decrease grain size and grain size distribution in CoCr15Ta3.5Ni10Pt5/Cr longitudinal thin film media, a very thin CrW54 seedlayer combined with a dry-etching process were utilized. In the media dry etched after CrW54 deposition, utilization of 1.5 nm CrW54 reduces the grain diameter and σ to 9.4 and 2.2 nm, respectively. By optimizing CrW54 seedlayer thickness and dry-etching process, grain diameter and σ of the magnetic layer can be reduced while maintaining coercivity, longitudinal orientation of magnetic grains, and magnetic interactions.

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M3 - Article

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JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 9 III

ER -

Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media

Abstract

ASJC Scopus subject areas

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