Gold mesh structures with controlled aperture ratios fabricated by reactive-monolayer-assisted thermal nanoimprint lithography

Shoichi Kubo, Koichi Nagase, Masaru Nakagawa

    Research output: Contribution to journalArticlepeer-review

    4 Citations (Scopus)

    Abstract

    Fabrication of Au mesh structures by reactive-monolayerassisted thermal nanoimprint lithography was demonstrated. A fluorescent dye-doped polystyrene thin film on a Au-plated substrate modified with a photoreactive monolayer was transformed using a mold with a lattice pattern. Au mesh patterns were obtained by removal of the residual layers and subsequent wet etching. The aperture ratio could be tuned by controlled side-etching. Au mesh structures with a Au line width of approximately 1μm are promising for transparent conductive substrates.

    Original languageEnglish
    Pages (from-to)1291-1293
    Number of pages3
    JournalChemistry Letters
    Volume41
    Issue number10
    DOIs
    Publication statusPublished - 2012 Nov 7

    ASJC Scopus subject areas

    • Chemistry(all)

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