TY - JOUR
T1 - Generation and extinction characteristics of negative ions in pulse-time-modulated electron cyclotron resonance chlorine plasma
AU - Mieno, T.
AU - Samukawa, S.
PY - 1997/12/1
Y1 - 1997/12/1
N2 - The time dependence of plasma parameters in a pulse-time-modulated electron cyclotron resonance plasma of Cl2 and Ar source gases is measured. It is found that Cl2 plasma produces a large quantity of negative ions during afterglow and decay times of electron density, electron temperature and sheath potential of Cl2 plasma are much smaller than those of Ar plasma. The negative ions in Cl2 plasma stay for a long time in the afterglow and they quickly become extinct when the microwave power is turned on. These characteristics suggest that the pulse modulation of Cl2 plasma produces a large amount of negative ions and changes the flow of charged particles through the sheath region to the substrate surface, which enables us to improve highly anisotropic and charge-free poly-Si etching.
AB - The time dependence of plasma parameters in a pulse-time-modulated electron cyclotron resonance plasma of Cl2 and Ar source gases is measured. It is found that Cl2 plasma produces a large quantity of negative ions during afterglow and decay times of electron density, electron temperature and sheath potential of Cl2 plasma are much smaller than those of Ar plasma. The negative ions in Cl2 plasma stay for a long time in the afterglow and they quickly become extinct when the microwave power is turned on. These characteristics suggest that the pulse modulation of Cl2 plasma produces a large amount of negative ions and changes the flow of charged particles through the sheath region to the substrate surface, which enables us to improve highly anisotropic and charge-free poly-Si etching.
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U2 - 10.1088/0963-0252/6/3/017
DO - 10.1088/0963-0252/6/3/017
M3 - Article
AN - SCOPUS:0031210506
VL - 6
SP - 398
EP - 404
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
SN - 0963-0252
IS - 3
ER -