Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source

Seiji Samukawa, Keisuke Sakamoto, Katsunori Ichiki

Research output: Contribution to journalArticle

153 Citations (Scopus)

Abstract

A high-performance neutral-beam etching system, which minimizes radiation damage caused by charge buildup or ultraviolet and x-ray photons during etching, was discussed. It was found that the bottom carbon plate of the etching systems possessed numerous aperture for extraction of neutral beams from the plasma. The analysis showed that the neutralization efficiency of negative ions and maximum neutral flux density were 100% and 4.0 mA/cm2 respectively.

Original languageEnglish
Pages (from-to)1566-1573
Number of pages8
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume20
Issue number5
DOIs
Publication statusPublished - 2002 Sep 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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