Ge dot formation using germane on a monomethylsilane-adsorbed Si(001)-2 × 1 surface

Yuzuru Narita, Takeshi Murata, Atsushi Kato, Tetsuo Endoh, Maki Suemitsu

Research output: Contribution to journalArticle

Abstract

Germanium (Ge) dots were formed on Si(001)-2 × 1 surface by gas-source MBE using germane (GeH4) and monomethylsilane (MMS). Predeposition of C atoms using MMS in prior to Ge growth greatly reduced the size and increased the density of the Ge dots grown on the surface. Carbon atoms were introduced via saturated adsorption of MMS followed by annealing to remove the adsorbed hydrogen atoms. To clarify the behavior of H and C atoms during annealing, we investigated the surface Si hydrides using multiple-internal-reflection Fourier transform infrared spectrometry. After an annealing at 500 °C for 1 min, almost all surface hydrogen atoms were desorbed and almost all C atoms were diffused into the subsurface and the bulk of the Si substrate, which is related to the observed miniaturization of the Ge dots and the increase of their density as well.

Original languageEnglish
Pages (from-to)200-202
Number of pages3
JournalThin Solid Films
Volume508
Issue number1-2
DOIs
Publication statusPublished - 2006 Jun 5

Keywords

  • Annealing process
  • C incorporation
  • Ge dot
  • Monomethylsilane

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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