Gasochromic properties of nanostructured tungsten oxide films prepared by sputtering deposition

Katsuyoshi Takano, Aichi Inouye, Shunya Yamamoto, Masaki Sugimoto, Masahito Yoshikawa, Shinji Nagata

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

The effects of surface morphology on the gasochromic properties of tungsten trioxide (WO3) films are reported. WO3 films with various crystalline structures and surface morphologies are prepared by reactive rf magnetron sputtering by adjusting the substrate temperature and oxygen concentration in a sputtering gas during deposition. Grain structures on these films were confirmed by atomic force microscopy observation. The gasochromic properties of the WO3 films coated with a palladium catalyst were examined on the basis of a change in optical transmittance with 645-nm-wavelength light in 1% hydrogen in argon gas. WO3 films with a (001) orientation show sufficient gasochromic properties for their application to fiber-optic hydrogen gas sensors. The growth of the nanocrystalline structure in the WO3 films seems to improve gasochromic properties.

Original languageEnglish
Pages (from-to)6315-6318
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number9 B
DOIs
Publication statusPublished - 2007 Sep 20

Keywords

  • Gasochromic coloration
  • Hydrogen sensor
  • Nanostructure
  • Surface morphology
  • Tungsten oxide

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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