GaNAs(001) surface phases under growing condition

Takahiro Mori, Toshiharu Morimura, Takashi Hanada, Takafumi Yao

Research output: Contribution to journalArticlepeer-review

Abstract

GaNAsGaAs (001) growth surfaces were investigated by reflectance difference (RD)anisotropy spectroscopy. In situ monitoring was carried out in a plasma-assisted molecular-beam epitaxy system during growth. In the growth temperature range of our experiment, the reflection high-energy electron diffraction pattern always showed a (2×4) reconstruction pattern, however, we observed three types of RD spectra. It was suggested that the GaNAs growth surface has three phases because RD spectra properly reflect surface electronic states. It is revealed that the phases are independent from nitrogen concentration, but dependent upon growth temperature and As4 Ga flux ratio. In this article, we show the results of the RD observation, present a phase diagram, and discuss possible GaNAs growth surfaces.

Original languageEnglish
Pages (from-to)1341-1344
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume23
Issue number3
DOIs
Publication statusPublished - 2005
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'GaNAs(001) surface phases under growing condition'. Together they form a unique fingerprint.

Cite this