TY - JOUR
T1 - Gadolinium oblique evaporation approach to make large scale neutron absorption gratings for phase imaging
AU - Samoto, Tetsuo
AU - Takano, Hidekazu
AU - Momose, Atsushi
N1 - Funding Information:
This work was supported by JST ERATO [grant number JPMJER1403], Japan. A part of this work was supported by "Nanotechnology Platform" of the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan, at the Center for Integrated Nanotechnology Support, Tohoku University.
Publisher Copyright:
© 2019 The Japan Society of Applied Physics.
PY - 2019
Y1 - 2019
N2 - Neutron phase imaging is a developing technology following the earlier development of X-ray phase imaging using gratings. Making high aspect ratio structures for neutron gratings is crucial to ensure the sufficient function of neutron absorption gratings, for which the usage of Gd is effective. Oblique evaporation of Gd on a Si grating is an excellent approach for Gd grating fabrication, but non-uniformity is a remaining problem in fabricating gratings large enough for the required field of view of neutron phase imaging. In this study, we propose a fabrication process, in which a Si grating is moved during the oblique evaporation process to attain uniform deposition of Gd in a 64 mm × 64 mm area. X-ray microtomography was used to evaluate fabricated gratings by depicting deposited Gd density distribution in grating units cut out by a focused ion beam (FIB).
AB - Neutron phase imaging is a developing technology following the earlier development of X-ray phase imaging using gratings. Making high aspect ratio structures for neutron gratings is crucial to ensure the sufficient function of neutron absorption gratings, for which the usage of Gd is effective. Oblique evaporation of Gd on a Si grating is an excellent approach for Gd grating fabrication, but non-uniformity is a remaining problem in fabricating gratings large enough for the required field of view of neutron phase imaging. In this study, we propose a fabrication process, in which a Si grating is moved during the oblique evaporation process to attain uniform deposition of Gd in a 64 mm × 64 mm area. X-ray microtomography was used to evaluate fabricated gratings by depicting deposited Gd density distribution in grating units cut out by a focused ion beam (FIB).
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U2 - 10.7567/1347-4065/ab138d
DO - 10.7567/1347-4065/ab138d
M3 - Article
AN - SCOPUS:85069044621
SN - 0021-4922
VL - 58
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - SD
M1 - SDDF12
ER -