Fundamental characteristics of liquid cluster ion source for surface modification

G. H. Takaoka, H. Noguchi, K. Nakayama, Y. Hironaka, Masakazu Kawashita

Research output: Contribution to journalConference articlepeer-review

19 Citations (Scopus)

Abstract

We have developed a cluster ion source using liquid organic materials, which has several advantages for surface modification based on the different properties of liquid cluster ions. When vapors of liquid materials such as ethanol were ejected through a nozzle into a high-vacuum region, clusters were produced by an adiabatic expansion phenomenon. The clusters produced were ionized by an electron bombardment method, and the cluster ion current increased with increase of an electron current for ionization. In order to achieve the effective transport of cluster ion beams, a unipotential or einzel lens was used. The current density was much larger than that without using the lens. Furthermore, the beam diameter could be controlled by adjusting the lens voltage, and it was changed between 5 mm and 20 mm. In addition, several kinds of substrates such as Si, SiO2, PC substrates were irradiated at different acceleration voltages with ethanol cluster ion beams, and chemical and physical sputtering with a high sputtering yield was achieved. The sputtered surfaces were very smooth at an atomic level. The liquid cluster ion beams have a high potential for surface etching with the atomic level flatness, which is not obtained by a conventional wet process.

Original languageEnglish
Pages (from-to)402-405
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume237
Issue number1-2
DOIs
Publication statusPublished - 2005 Aug 1
EventIon Implantation Technology Proceedings of the 15th International Conference on Ion Implantation Technology ITT 2004 -
Duration: 2004 Oct 252004 Oct 27

Keywords

  • Cluster ion
  • Ion beam
  • Liquid cluster
  • Surface etching
  • Wet process

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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