F2 laser-induced damage on transparent fluoride crystals

Yoshizo Kawaguchi; Aiko Narazaki; Tadatake Sato; Ryozo Kurosaki; Hiroyuki Niino; Hiroki Sato; Tomohiko Satonaga; Tsuguo Fukuda

doi:10.1117/12.596411

F₂ laser-induced damage on transparent fluoride crystals

Yoshizo Kawaguchi, Aiko Narazaki, Tadatake Sato, Ryozo Kurosaki, Hiroyuki Niino, Hiroki Sato, Tomohiko Satonaga, Tsuguo Fukuda

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Conference article › peer-review

Abstract

For the application of F₂ lasers to micro- / nano-fabrication including photolithography, one of the important research subjects is to eliminate the chromatic aberration, and combination of lenses made of two optical materials with different refractive indices is the effective way. However, only CaF₂ is widely applied to lenses for a vacuum ultraviolet (VUV) beam, and a "second material" to be paired with CaF₂ is strongly requested. Here, we examined two fluoride crystals which are transparent in the VUV region, BaF₂ and LiCaAIF₆ grown by the Czochralski technique, as candidates for VUV optics. We investigated the change of the VUV transmittance and the onset of optical damage of these fluoride crystals against F₂ laser irradiation. These crystals showed good optical tolerance against cumulative F₂ laser irradiation, and the damage threshold of LiCaAIF₆ was similar to mat of VUV grade CaF₂ while that of BaF₂ was about half of the other two fluoride crystals.

Original language	English
Article number	71
Pages (from-to)	438-443
Number of pages	6
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5662
DOIs	https://doi.org/10.1117/12.596411
Publication status	Published - 2004
Event	Fifth International Symposium on Laser Precision Microfabrication - Nara, Japan Duration: 2004 May 11 → 2004 May 14

Keywords

BaF
Damage threshold
F laser lithography
F laser processing
LiCaAIF
Optical damage
Optical material
Transmittance
Vacuum ultraviolet light

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.596411

Cite this

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title = "F2 laser-induced damage on transparent fluoride crystals",

abstract = "For the application of F2 lasers to micro- / nano-fabrication including photolithography, one of the important research subjects is to eliminate the chromatic aberration, and combination of lenses made of two optical materials with different refractive indices is the effective way. However, only CaF2 is widely applied to lenses for a vacuum ultraviolet (VUV) beam, and a {"}second material{"} to be paired with CaF2 is strongly requested. Here, we examined two fluoride crystals which are transparent in the VUV region, BaF2 and LiCaAIF6 grown by the Czochralski technique, as candidates for VUV optics. We investigated the change of the VUV transmittance and the onset of optical damage of these fluoride crystals against F2 laser irradiation. These crystals showed good optical tolerance against cumulative F2 laser irradiation, and the damage threshold of LiCaAIF6 was similar to mat of VUV grade CaF2 while that of BaF2 was about half of the other two fluoride crystals.",

keywords = "BaF, Damage threshold, F laser lithography, F laser processing, LiCaAIF, Optical damage, Optical material, Transmittance, Vacuum ultraviolet light",

author = "Yoshizo Kawaguchi and Aiko Narazaki and Tadatake Sato and Ryozo Kurosaki and Hiroyuki Niino and Hiroki Sato and Tomohiko Satonaga and Tsuguo Fukuda",

year = "2004",

doi = "10.1117/12.596411",

language = "English",

volume = "5662",

pages = "438--443",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

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note = "Fifth International Symposium on Laser Precision Microfabrication ; Conference date: 11-05-2004 Through 14-05-2004",

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T1 - F2 laser-induced damage on transparent fluoride crystals

AU - Kawaguchi, Yoshizo

AU - Narazaki, Aiko

AU - Sato, Tadatake

AU - Kurosaki, Ryozo

AU - Niino, Hiroyuki

AU - Sato, Hiroki

AU - Satonaga, Tomohiko

AU - Fukuda, Tsuguo

PY - 2004

Y1 - 2004

N2 - For the application of F2 lasers to micro- / nano-fabrication including photolithography, one of the important research subjects is to eliminate the chromatic aberration, and combination of lenses made of two optical materials with different refractive indices is the effective way. However, only CaF2 is widely applied to lenses for a vacuum ultraviolet (VUV) beam, and a "second material" to be paired with CaF2 is strongly requested. Here, we examined two fluoride crystals which are transparent in the VUV region, BaF2 and LiCaAIF6 grown by the Czochralski technique, as candidates for VUV optics. We investigated the change of the VUV transmittance and the onset of optical damage of these fluoride crystals against F2 laser irradiation. These crystals showed good optical tolerance against cumulative F2 laser irradiation, and the damage threshold of LiCaAIF6 was similar to mat of VUV grade CaF2 while that of BaF2 was about half of the other two fluoride crystals.

AB - For the application of F2 lasers to micro- / nano-fabrication including photolithography, one of the important research subjects is to eliminate the chromatic aberration, and combination of lenses made of two optical materials with different refractive indices is the effective way. However, only CaF2 is widely applied to lenses for a vacuum ultraviolet (VUV) beam, and a "second material" to be paired with CaF2 is strongly requested. Here, we examined two fluoride crystals which are transparent in the VUV region, BaF2 and LiCaAIF6 grown by the Czochralski technique, as candidates for VUV optics. We investigated the change of the VUV transmittance and the onset of optical damage of these fluoride crystals against F2 laser irradiation. These crystals showed good optical tolerance against cumulative F2 laser irradiation, and the damage threshold of LiCaAIF6 was similar to mat of VUV grade CaF2 while that of BaF2 was about half of the other two fluoride crystals.

KW - BaF

KW - Damage threshold

KW - F laser lithography

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KW - Optical material

KW - Transmittance

KW - Vacuum ultraviolet light

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