Freestanding GaN resonant gratings at telecommunication range

Material Science

• Gallium Nitride 100%
• Electron Optical Lithography 33%
• Membrane 16%
• Etching 16%

Engineering

• Experimental Result 16%
• Membrane 16%
• Deep Reactive Ion Etching 16%
• Analysis Method 16%
• Grating Period 16%
• Duty Ratio 16%
• Reflectance Measurement 16%
• Properties 16%
• Demonstrates 16%
• Full Width 16%

Physics

• Membrane 16%
• Theoretical Model 16%
• Responses 16%
• Atoms 16%
• Width 16%
• Etching 16%