Free-standing subwavelength grid infrared rejection filter of 90 MM diameter for LPP EUV light source

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

A subwavelength grid infrared (IR) filter as large as 90 mm in diameter was fabricated and tested on a 6 inch Si wafer for a laser-produced plasma (LPP) extreme ultraviolet (EUV) light source used in the next generation lithography tools. The IR filter is a grid type, which has higher thermal stability compared with a conventional multilayer metal membrane filter. The grid is a free-standing Mo-coated Si honeycomb structure with a thickness of 5 μm, a wire width of only 0.35 μm and a pitch of 4.5 μm. Such a large-size free-standing microstructure was successfully fabricated by carefully balancing film stress at each process step. The fabricated IR filter demonstrated 99.7 % rejection for 10.6 μm IR light.

Original languageEnglish
Title of host publicationMEMS 2014 - 27th IEEE International Conference on Micro Electro Mechanical Systems
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages482-485
Number of pages4
ISBN (Print)9781479935086
DOIs
Publication statusPublished - 2014 Jan 1
Event27th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2014 - San Francisco, CA, United States
Duration: 2014 Jan 262014 Jan 30

Publication series

NameProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN (Print)1084-6999

Other

Other27th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2014
CountryUnited States
CitySan Francisco, CA
Period14/1/2614/1/30

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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