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Free-Ion Yield for Tetramethylsilane and Tetrarnethylgermanium
Y. Hoshi, M. Higuchi, H. Iso, M. Sakamoto, K. Ooyama, H. Yuta, K. Abe, K. Hasegawa, F. Suekane, N. Kawamura, M. Neichi, K. Suzuki, K. Masuda, R. Kikuchi, K. Miyano
Research output: Contribution to journal › Article › peer-review
3
Citations
(Scopus)