Fracture strength of chemically vapor deposited diamond on the substrate and its relation to the crystalline structure

S. Kamiya, H. Takahashi, A. Kobayashi, M. Saka, H. Abé

Research output: Contribution to journalConference article

9 Citations (Scopus)

Abstract

The mechanical strength of chemically vapor deposited diamond is characterized in terms of fracture toughness. The toughness of film and adhesion interface to the substrate were independently measured using techniques recently developed by the authors. In this paper, diamond was deposited by microwave plasma chemical vapor deposition using a variety of deposition conditions. The fracture toughness of the interface initially increased and then decreased with increasing amounts of methane in the source gas mixture. On the contrary, the toughness of the films was simply found to decrease with respect to the increment of methane concentration. This interesting trend of toughness was explained by the crystalline structure of the deposited diamond.

Original languageEnglish
Pages (from-to)1110-1114
Number of pages5
JournalDiamond and Related Materials
Volume9
Issue number3
DOIs
Publication statusPublished - 2000 Jan 1
Event10th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide - Prague, Czech Republic
Duration: 1999 Sep 121999 Sep 17

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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