Fracture strength of chemically vapor deposited diamond on the substrate and its relation to the crystalline structure

S. Kamiya; H. Takahashi; A. Kobayashi; M. Saka; H. Abé

doi:10.1016/S0925-9635(99)00331-3

Fracture strength of chemically vapor deposited diamond on the substrate and its relation to the crystalline structure

S. Kamiya, H. Takahashi, A. Kobayashi, M. Saka, H. Abé

Research output: Contribution to journal › Conference article › peer-review

9 Citations (Scopus)

Abstract

The mechanical strength of chemically vapor deposited diamond is characterized in terms of fracture toughness. The toughness of film and adhesion interface to the substrate were independently measured using techniques recently developed by the authors. In this paper, diamond was deposited by microwave plasma chemical vapor deposition using a variety of deposition conditions. The fracture toughness of the interface initially increased and then decreased with increasing amounts of methane in the source gas mixture. On the contrary, the toughness of the films was simply found to decrease with respect to the increment of methane concentration. This interesting trend of toughness was explained by the crystalline structure of the deposited diamond.

Original language	English
Pages (from-to)	1110-1114
Number of pages	5
Journal	Diamond and Related Materials
Volume	9
Issue number	3
DOIs	https://doi.org/10.1016/S0925-9635(99)00331-3
Publication status	Published - 2000
Externally published	Yes
Event	10th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide - Prague, Czech Republic Duration: 1999 Sep 12 → 1999 Sep 17

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Chemistry(all)
Mechanical Engineering
Materials Chemistry
Electrical and Electronic Engineering

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10.1016/S0925-9635(99)00331-3

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@article{b582fd1ca8204076bd7c02c921d6fc95,

title = "Fracture strength of chemically vapor deposited diamond on the substrate and its relation to the crystalline structure",

abstract = "The mechanical strength of chemically vapor deposited diamond is characterized in terms of fracture toughness. The toughness of film and adhesion interface to the substrate were independently measured using techniques recently developed by the authors. In this paper, diamond was deposited by microwave plasma chemical vapor deposition using a variety of deposition conditions. The fracture toughness of the interface initially increased and then decreased with increasing amounts of methane in the source gas mixture. On the contrary, the toughness of the films was simply found to decrease with respect to the increment of methane concentration. This interesting trend of toughness was explained by the crystalline structure of the deposited diamond.",

author = "S. Kamiya and H. Takahashi and A. Kobayashi and M. Saka and H. Ab{\'e}",

year = "2000",

doi = "10.1016/S0925-9635(99)00331-3",

language = "English",

volume = "9",

pages = "1110--1114",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier BV",

number = "3",

note = "10th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide ; Conference date: 12-09-1999 Through 17-09-1999",

}

TY - JOUR

T1 - Fracture strength of chemically vapor deposited diamond on the substrate and its relation to the crystalline structure

AU - Kamiya, S.

AU - Takahashi, H.

AU - Kobayashi, A.

AU - Saka, M.

AU - Abé, H.

PY - 2000

Y1 - 2000

N2 - The mechanical strength of chemically vapor deposited diamond is characterized in terms of fracture toughness. The toughness of film and adhesion interface to the substrate were independently measured using techniques recently developed by the authors. In this paper, diamond was deposited by microwave plasma chemical vapor deposition using a variety of deposition conditions. The fracture toughness of the interface initially increased and then decreased with increasing amounts of methane in the source gas mixture. On the contrary, the toughness of the films was simply found to decrease with respect to the increment of methane concentration. This interesting trend of toughness was explained by the crystalline structure of the deposited diamond.

AB - The mechanical strength of chemically vapor deposited diamond is characterized in terms of fracture toughness. The toughness of film and adhesion interface to the substrate were independently measured using techniques recently developed by the authors. In this paper, diamond was deposited by microwave plasma chemical vapor deposition using a variety of deposition conditions. The fracture toughness of the interface initially increased and then decreased with increasing amounts of methane in the source gas mixture. On the contrary, the toughness of the films was simply found to decrease with respect to the increment of methane concentration. This interesting trend of toughness was explained by the crystalline structure of the deposited diamond.

UR - http://www.scopus.com/inward/record.url?scp=0033738963&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033738963&partnerID=8YFLogxK

U2 - 10.1016/S0925-9635(99)00331-3

DO - 10.1016/S0925-9635(99)00331-3

M3 - Conference article

AN - SCOPUS:0033738963

VL - 9

SP - 1110

EP - 1114

JO - Diamond and Related Materials

JF - Diamond and Related Materials

SN - 0925-9635

IS - 3

T2 - 10th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide

Y2 - 12 September 1999 through 17 September 1999

ER -

Fracture strength of chemically vapor deposited diamond on the substrate and its relation to the crystalline structure

Abstract

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