Formation of Si and Ge films and micropatterns by wet process using laser direct writing method

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)

    Abstract

    The studies toward the formation of Si and Ge films and micropatterns by wet process using laser direct writing method are reported. First is the the formation of Si film by laser scanning irradiation to Si nano- or micro-particle dispersed films. By using organogermanium nanocluster (OrGe) as a dispersion medium of Si particles, a homogeneous Si film was formed by laser scanning irradiation on a Si particle/OrGe composite film. The micro-Raman spectra showed the formation of the polycrystalline Ge and SiGe alloy during the fusion of the Si particles by laser irradiation. The second is the formation of the Si and Ge micropatterns by LLDW (liquid phase laser direct writing) method. Micro-Raman spectra showed the formation of polycrystalline Si and Ge micropatterns by laser irradiation on the interfaces of SiCl4/substrate and GeCl 4/substrate, respectively.

    Original languageEnglish
    Title of host publicationLaser-Based Micro- and Nanopackaging and Assembly V
    DOIs
    Publication statusPublished - 2011 Mar 31
    EventLaser-Based Micro- and Nanopackaging and Assembly V - San Francisco, CA, United States
    Duration: 2011 Jan 252011 Jan 27

    Publication series

    NameProceedings of SPIE - The International Society for Optical Engineering
    Volume7921
    ISSN (Print)0277-786X

    Other

    OtherLaser-Based Micro- and Nanopackaging and Assembly V
    CountryUnited States
    CitySan Francisco, CA
    Period11/1/2511/1/27

    Keywords

    • Germanium semiconductor
    • Laser direct writing
    • Laser scanning irradiation
    • Liquid phase laser direct writing
    • Organogermanium nanocluster
    • SiGe alloy
    • Silicon semiconductor
    • Wet process

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Computer Science Applications
    • Applied Mathematics
    • Electrical and Electronic Engineering

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