Formation of semiconducting polymer film by laser CVD

The thin films of semiconducting polymers such as poly(W-vinylcarbazole), polythiophene, polypyrrole, and polyaniline were formed by the laser chemical vapor deposition ( CVD). The 355-nm laser excitation of N-vinylcarbazole deposited on a quartz substrate gave the poly(W-vinylcarba-zole) film with the molecular weight Mw=11860 (Mw/Mn= 7. 18). The sandwich excimer/second excimer emission ratio of the time-resolved emission spectra suggested the isotactic structure of the poly(W-vinylcarbazole) film prepared by the laser CVD. The micropatterns of the poly(^N-vinylcarbazole) with the resolution of about 20 (. im were formed by the laser irradiation through a photomask. The laser flash photolysis of the W-vinylcarbazole showed the generation of the radical cation, which suggests the cationic polymerization mechanism. The optical band gap of polythiophene film was decreased with increasing laser excitation power.