Formation of semiconducting polymer film by laser CVD

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4 Citations (Scopus)

Abstract

The thin films of semiconducting polymers such as poly(W-vinylcarbazole), polythiophene, polypyrrole, and polyaniline were formed by the laser chemical vapor deposition ( CVD). The 355-nm laser excitation of N-vinylcarbazole deposited on a quartz substrate gave the poly(W-vinylcarba-zole) film with the molecular weight Mw=11860 (Mw/Mn= 7. 18). The sandwich excimer/second excimer emission ratio of the time-resolved emission spectra suggested the isotactic structure of the poly(W-vinylcarbazole) film prepared by the laser CVD. The micropatterns of the poly(N-vinylcarbazole) with the resolution of about 20 (. im were formed by the laser irradiation through a photomask. The laser flash photolysis of the W-vinylcarbazole showed the generation of the radical cation, which suggests the cationic polymerization mechanism. The optical band gap of polythiophene film was decreased with increasing laser excitation power.

Original languageEnglish
Pages (from-to)197-204
Number of pages8
JournalJournal of Photopolymer Science and Technology
Volume10
Issue number2
DOIs
Publication statusPublished - 1997

Keywords

  • Laser cvd
  • Micropatterning
  • Semiconducting polymer

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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