Formation of organic-inorganic hybrid films based on silsesquioxane

Akira Watanabe; Tokuji Miyashita

Formation of organic-inorganic hybrid films based on silsesquioxane

Center for Mineral Processing and Metallurgy (CMPM)

Research output: Contribution to conference › Paper › peer-review

Abstract

The polysilsesquioxane (PSQ) is an organometallic polymer consisting of Si-O-Si cage structure and organic side chains. The PSQ has attracted much attention because of the high transparency and the excellent heat-resisting property. The purpose of our study is the functionalization of the PSQ. In this paper, we report the micropatterning of organic-inorganic films consisting of multifunctional double-decker (DD) type silsesquioxane and the polymer. The micropatterning of the film was achieved by application of the phosensitive sol-gel reaction using titanium methacrylate triisopropoxide (TMTP) and benzoyl acetone (BA). The micro-pattern with ca. 1 μm resolution was obtained by UV-irradiation through photomask on the hybrid film consisting of DD silanol, TMTP, and BA.

Original language	English
Number of pages	1
Publication status	Published - 2006 Oct 19
Event	55th SPSJ Annual Meeting - Nagoya, Japan Duration: 2006 May 24 → 2006 May 26

Other

Other	55th SPSJ Annual Meeting
Country	Japan
City	Nagoya
Period	06/5/24 → 06/5/26

Keywords

Micropatterning
Organic-inroganic hybrid
Silsesquioxane

ASJC Scopus subject areas

Engineering(all)

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abstract = "The polysilsesquioxane (PSQ) is an organometallic polymer consisting of Si-O-Si cage structure and organic side chains. The PSQ has attracted much attention because of the high transparency and the excellent heat-resisting property. The purpose of our study is the functionalization of the PSQ. In this paper, we report the micropatterning of organic-inorganic films consisting of multifunctional double-decker (DD) type silsesquioxane and the polymer. The micropatterning of the film was achieved by application of the phosensitive sol-gel reaction using titanium methacrylate triisopropoxide (TMTP) and benzoyl acetone (BA). The micro-pattern with ca. 1 μm resolution was obtained by UV-irradiation through photomask on the hybrid film consisting of DD silanol, TMTP, and BA.",

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AU - Watanabe, Akira

AU - Miyashita, Tokuji

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N2 - The polysilsesquioxane (PSQ) is an organometallic polymer consisting of Si-O-Si cage structure and organic side chains. The PSQ has attracted much attention because of the high transparency and the excellent heat-resisting property. The purpose of our study is the functionalization of the PSQ. In this paper, we report the micropatterning of organic-inorganic films consisting of multifunctional double-decker (DD) type silsesquioxane and the polymer. The micropatterning of the film was achieved by application of the phosensitive sol-gel reaction using titanium methacrylate triisopropoxide (TMTP) and benzoyl acetone (BA). The micro-pattern with ca. 1 μm resolution was obtained by UV-irradiation through photomask on the hybrid film consisting of DD silanol, TMTP, and BA.

AB - The polysilsesquioxane (PSQ) is an organometallic polymer consisting of Si-O-Si cage structure and organic side chains. The PSQ has attracted much attention because of the high transparency and the excellent heat-resisting property. The purpose of our study is the functionalization of the PSQ. In this paper, we report the micropatterning of organic-inorganic films consisting of multifunctional double-decker (DD) type silsesquioxane and the polymer. The micropatterning of the film was achieved by application of the phosensitive sol-gel reaction using titanium methacrylate triisopropoxide (TMTP) and benzoyl acetone (BA). The micro-pattern with ca. 1 μm resolution was obtained by UV-irradiation through photomask on the hybrid film consisting of DD silanol, TMTP, and BA.

KW - Micropatterning

KW - Organic-inroganic hybrid

KW - Silsesquioxane

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